Study on New Chargeable Photoelectric Conversion Effect in Composite System of Tungstic Acid and Organic Polymer

a.考虑到氧、碳和氢的电负性分别为3.4、2.6和2.2，我们可以解释由添加剂引起的光致变色增强的起源，包括O-C-H结构。在O-C键中，氧比碳更强烈地吸引电子。因此，如果碳形成诸如O-C-H的键，则碳和氢之间的键强度将比氧和碳之间的键强度弱得多。在这种情况下，氢可以容易地随着光生空穴的氧化而释放。另一方面，如果碳与烷基键合，则在O-C-H结构中碳与烷基之间的键比碳与氢之间的键强，因为烷基是电子供体。它也一直解释说，酮和羧酸不显示光致变色增强，因为他们没有旁边的O-C键的氢。B.我们研究了在钨酸和明胶和硅胶的凝胶化过程中的表面波的性质的时间分辨表面波测量。波数指数chi（ω-kappa ^2，1.5和1.0分别表示表面张力和弹性波）的变化清楚地表明了这种异常。钨酸的X 1在溶胶状态下约为1.4，在胶凝点时迅速降低到1.0。明胶的chi在溶胶状态下约为1.4（与钨酸相同），并且在胶凝点之后逐渐降低。另一方面，在凝胶化点之后，硅胶的chi保持在1.5附近。c.我们研究了溶胶-凝胶法中重要的凝胶的脱水过程，发现凝胶中溶剂与聚合物网络之间的相互作用对脱水过程的特性有很大的影响。

a.We could explain the origin of the photochromic enhancement by the additives, including the O-C-H structure, taking account of the electronegativities of oxygen, carbon and hydrogen that have the values rhof 3.4,2.6 and 2.2, respectively, In the O-C bond, the oxygen will more strongly attract the electron than the carbon. Thus, if carbon makes bonds such as O-C-H, the bond strength between the carbon and hydrogen will be much weaker than that between the oxygen and carbon. In such a case, the hydrogen may be easily released with oxidation by the photogenerated hole. On the other hand, if the carbon bonds with an alkyl group, the bond between the carbon and the alkyl group is stronger than that between the carbon and the hydrogen in the O-C-H structure since the alkyl group is an electron donor. It has also been consistently explained that ketones and carboxylic acids do not show the photochromic enhancement because they do not have hydrogen next to the O-C bond.b.We studied the properties of surface waves during the gelation process of tungstic acid and gelatin and silica gel by the time resolved surface wave measurements. The anomaly is clearly shown in the change of the wave number exponent chi(omega-kappa^2 , the values 1.5 and 1.0 indicate surface tension and elastic wave, respectively). chi of the tungstic acid was about 1.4 in the sol state and rapidly decreased to 1.0 at the gelation point. chi of gelatin was about 1.4 (same as tungstic acid) in the sol state and decreased gradually after the gelation point. On the other side, chi of silica gel remained near 1.5 after the gelation point.c.We have studied dehydration process of gels, which are improtant to use the sol-gel method, and have found that the feature of the dehydration process has been much affected by the interaction between solvent and polymer network in the gels.