Basic study on decomposition of air pollutants using synergetic effect between barrier discharge and VUV light

对空气污染物的分解物、如硝基二氧化物、荧光碳的研究（C型D27型D2 F型D216型D2， （C型D23型D2 F型D27型D2）D型D23型D2 N/（C型D24型D24型D2）D型D23型D2 N or C型D28型D28型D2/ C型D28型D2 F型D216型D2 O）， volatile chemical compounds，等等，并将它们转换为非有害物质已被携带出来使用电气放电和紫外线光（172纳米）辐射的混合方法。屏障型和日冕型之间的电荷特性被模拟为设计有效的分解系统和VUV光源。结果显示如下：1）在1和3 Torr之间，NO I-D22 I-D2与气体压力之间的气体压力分解成N I-D22 I-D2和O I-D22 I-D2由dc释放，在添加中，VUV的辐射使分解速度加速。通过气体色谱学、等离子体和四极质量分析的排放指标来确认分解物种的协同效应。 ... More Fluorocarbons， CイイD27イイD2FイイD216イイD2， （CイD23イイD2FイD27イD2）イD23イD2N/（CイD24イD2FイD2）イD23イD2N and CイD28イD2FイD216イD2O， were decomposed by dc and rf discharge plasma。在这种情况下，VUV辐射似乎没有协同效应。In a plasma phase a various kind of species， such as CF， CFイイD22イイD2， CFイD23イD2，CイD22イD2FイD25イD2，CイD23イD2FイD23イD2，CイD23イD2FイD25イD2，CイD23イD2FイD26イD2， were observed by a mass analysis method。Some of the fragments among them were found to be captured on the electrode surface as a film.3） On the electrode surface it was seen by XPS spectra that thin film is composed of CF、CF y D22 y D2、CF y D23 y D2 and-C-CF y D2 x y D2。这部电影很好，命名为高电强度和低电常数的电气特性。4）本结果建议，这部电影适用于集成电路和功率装置绝缘的中间层绝缘。5）通过计算机模拟方法分析了VUV的应用和污染物的分解。Less（低）

Investigation on decomposition of air pollutants, such as nitrogen dioxides, fluorocarbons (CィイD27ィエD2FィイD216ィエD2, (CィイD23ィエD2FィイD27ィエD2)ィイD23ィエD2N/(CィイD24ィエD2FィイD24ィエD2)ィイD23ィエD2N or CィイD28ィエD2FィイD28ィエD2/ CィイD28ィエD2FィイD216ィエD2O), volatile chemical compounds, etc. and change them into non-harmful substances has been carried out using a hybrid method of electrical discharge and VUV light (172nm) irradiation. The discharge characteristics between barrier and corona type has been simulated in order to design an efficient decomposing system and VUV light source. The results are shown as follows,1) NOィイD22ィエD2 with gas pressures between 1 and 3 Torr was decomposed into NィイD22ィエD2 and OィイD22ィエD2 by dc discharge, in addition, by irradiation of VUV light the decomposition speed was accelerated. The synergetic effect for the decomposition level and speed were confirmed by observation of the decomposed species by a gas chromatography, emission spectra from plasma and a quadrupole mass analysis.2 … More ) Fluorocarbons, CィイD27ィエD2FィイD216ィエD2, (CィイD23ィエD2FィイD27ィエD2)ィイD23ィエD2N/(CィイD24ィエD2FィイD24ィエD2)ィイD23ィエD2N and CィイD28ィエD2FィイD28ィエD2/CィイD28ィエD2FィイD216ィエD2O, were decomposed by dc and rf discharge plasma. In this case no synergetic effect by VUV irradiation was seen. In a plasma phase a various kind of species, such as CF, CFィイD22ィエD2, CFィイD23ィエD2, CィイD22ィエD2FィイD23ィエD2, CィイD22ィエD2FィイD25ィエD2, CィイD23ィエD2FィイD23ィエD2, CィイD23ィエD2FィイD25ィエD2, CィイD23ィエD2FィイD26ィエD2, were observed by a mass analysis method. Some of the fragments among them were found to be captured on the electrode surface as a film.3) On the electrode surface it was seen by XPS spectra that thin film was composed of CF, CFィイD22ィエD2, CFィイD23ィエD2 and -C-CFィイD2xィエD2. The electrical properties of this film were fine, namely high electric strength and low dielectric constant.4) This result suggested that this film was applicable to interlayer insulation of integrated circuits and insulation of power apparatus.5) The barrier discharge for application of VUV and decomposition of pollutants was analyzed by a computer simulation method. Less