Room Temperature Terahertz Quantum Cascade Lasers on Silicon Substrates
Room Temperature Terahertz Quantum Cascade Lasers on Silicon Substrates
批准号:
EP/H02364X/1
负责人:
Douglas Paul
金额:
$81.95万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2010
资助国家:
英国
项目状态:
已结题
起止时间:
2010 至 --
中文摘要
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英文摘要
The THz part of the electromagnetic spectrum has a number of potential applications which include oncology (skin cancer imaging), security imaging, THz bandwidth photonics, production monitoring and astronomy. The U.K. has been one of the pioneering countries in THz research but also in the exploitation of the technology with a number of companies including TeraView, QMC Instruments and Thruvision. At present most commercial imaging and spectroscopy systems use expensive femtosecond lasers with photoconductive antenna which fundamentally limits the power output to the microWatt level. Virtually all the applications referenced above require room temperature sources with over 10 mW of output power if parallel, fast, high performance imaging and/or spectroscopy systems are to be developed.While interband recombination of electrons and holes in Si and Ge are inefficient due to the indirect bandgap of the semiconductors, intersubband transitions provide an alternative path to a laser for low energy radiation such as THz frequencies. Intersubband unipolar lasers in the form of quantum cascade lasers have been demonstrated using III-V materials. Powers up to 248 mW at 10 K have been demonstrated at THz frequencies but due to polar optical phonon scattering and the associated reduction in intersubband lifetimes as the temperature is increased, such devices only operate at cryogenic temperatures. Previous work has been undertaken on p-type Si/SiGe quantum cascade lasers but due to large non-parabolicity and large effective mass (0.3 to 0.4 m_0) in the valence band, significant gain above 10 cm^-1 is difficult to engineer.In this proposal, we propose to use pure Ge quantum well designs and L-valley electrons for the first experimental demonstration of a n-type Si-based quantum cascade laser grown on top of a Si substrate. We demonstrate that the low effective of 0.118 m_0 and long non-polar lifetimes in the Ge/SiGe system potentially provide gain close to values demonstrated in GaAs THz quantum cascade lasers at 4 K and also potentially allow 300 K operation. Further the cheap and mature available Si process technology will allow at least a x100 reduction in the cost of THz quantum cascade lasers compared to GaAs devices. Such devices could be further developed into vertical cavity emitters (i.e. VCSELs) for parallel imaging applications or integrated with Si photonics to allow THz bandwidth telecoms. Finally we propose optically pumped structures which have the potential for broadband tunability, higher output powers and higher operating temperatures than THz quantum cascade lasers.This programme has brought together the modelling and design toolsets at Leeds University with the CVD growth expertise at Warwick University combined with the fabrication and measurement expertise of SiGe devices at Glasgow University to deliver internationally leading research. We have a number of industrial partners (AdvanceSis, Kelvin Nanotechnology and TeraView) who provide direct exploitation paths for the research. Successful room temperature quantum cascade lasers are an enabling technology for many new markets for THz applications including oncology (skin cancer imaging), security imaging, production monitoring, proteomics, drug discovery and astronomy.
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Mid-infrared plasmonic antennas made of electron-doped epitaxial germanium-on-silicon
由电子掺杂外延硅基锗制成的中红外等离子体天线
DOI:
10.1109/irmmw-thz.2013.6665614
发表时间:
2013
期刊:
影响因子:
--
作者:
[Ortolani M]
通讯作者:
Ortolani M
Extending the emission wavelength of Ge nanopillars to 2.25 µm using silicon nitride stressors.
使用氮化硅应力源将 Ge 纳米柱的发射波长延长至 2.25 µm。
DOI:
10.1364/oe.23.018193
发表时间:
2015
期刊:
Optics express
影响因子:
3.8
作者:
[Millar RW]
通讯作者:
Millar RW
Expanding the Ge emission wavelength to 2.25 µm with SixNy strain engineering
通过 SixNy 应变工程将 Ge 发射波长扩展到 2.25 µm
DOI:
10.1016/j.tsf.2015.07.017
发表时间:
2016
期刊:
Thin Solid Films
影响因子:
2.1
作者:
[Millar R]
通讯作者:
Millar R
Ge/SiGe quantum confined Stark effect modulators with low voltage swing at λ= 1550 nm
Ge/SiGe 量子限制斯塔克效应调制器,具有低电压摆幅
DOI:
10.1109/group4.2014.6961946
发表时间:
2014
期刊:
影响因子:
--
作者:
[Dumas D]
通讯作者:
Dumas D
Silver antimony Ohmic contacts to moderately doped n-type germanium
银锑与中等掺杂 n 型锗的欧姆接触
DOI:
10.1063/1.4873127
发表时间:
2014
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Dumas D]
通讯作者:
Dumas D
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