Holographic Interference Lithography for Microbattery Applications

用于微电池应用的全息干涉光刻

• 批准号: 2606929
• 金额: --
• 依托单位: University of Cambridge
• 依托单位国家: 英国
• 项目类别: Studentship
• 财政年份: 2021
• 资助国家: 英国
• 起止时间: 2021 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=studentship-2606929
• 关键词: Holographic; Interference; Lithography; Microbattery; Applications

This project will develop a new maskless lithography system, "holographic multibeam interference lithographe (HMBIL)" capable of large-area, dynamically-reconfigurable nanoscale patterning, with sub-wavelength (optical) resolution, high throughput, and at least an order of magnitude lower cost than competing electron-beam lithography. This ability to create complex patterns with nanoscale features will enable the fabrication of next generation microbatteries. In this PhD project we will apply holographic interference lithography to create interdigitated Li-Ion microbatteries with nanopores for fast kinetics. The proposed lithography system will combine the interference lithography approach (demonstrated in the midi project) with the maskless holographic lithography systems previously demonstrated in Cambridge. In HMBIL, beams will be holographically pre-shaped prior to interference, which will allow us to form arbitrary patterns beyond the perfectly periodic patterns normally achievable with interference lithography. HMBIL will retain the compelling advantages of multibeam interference lithography, such as deeply sub-wavelength resolution and high-throughput patterning. The project will develop a prototype system to enable patterning of arbitrarily-shaped 100 nm feature sizes over large areas (wafer scale) with high throughput (>25 cm2 device area in under 1 hour), a combination which is currently unachievable with direct-write processes.

该项目将开发一种新的无掩模光刻系统，“全息多束干涉光刻机（HMBIL）”，能够大面积，动态可重构的纳米级图案化，具有亚波长（光学）分辨率，高吞吐量，并且比竞争的电子束光刻至少低一个数量级的成本。这种创造具有纳米级特征的复杂图案的能力将使下一代微电池的制造成为可能。在这个博士项目中，我们将应用全息干涉光刻来创建具有快速动力学纳米孔的叉指型锂离子微电池。建议的光刻系统将联合收割机的干涉光刻方法（在midi项目中演示）与无掩模全息光刻系统先前在剑桥演示。在HMBIL中，光束将在干涉之前进行全息预成形，这将使我们能够形成超出干涉光刻通常可实现的完美周期性图案的任意图案。HMBIL将保留多光束干涉光刻的令人信服的优势，如深亚波长分辨率和高通量图案化。该项目将开发一个原型系统，以实现大面积（晶圆级）上任意形状的100 nm特征尺寸的图案化，具有高吞吐量（1小时内>25 cm2器件面积），这是目前直接写入工艺无法实现的组合。