Holographic Interference Lithography for Microbattery Applications

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This project will develop a new maskless lithography system, "holographic multibeam interference lithographe (HMBIL)" capable of large-area, dynamically-reconfigurable nanoscale patterning, with sub-wavelength (optical) resolution, high throughput, and at least an order of magnitude lower cost than competing electron-beam lithography. This ability to create complex patterns with nanoscale features will enable the fabrication of next generation microbatteries. In this PhD project we will apply holographic interference lithography to create interdigitated Li-Ion microbatteries with nanopores for fast kinetics. The proposed lithography system will combine the interference lithography approach (demonstrated in the midi project) with the maskless holographic lithography systems previously demonstrated in Cambridge. In HMBIL, beams will be holographically pre-shaped prior to interference, which will allow us to form arbitrary patterns beyond the perfectly periodic patterns normally achievable with interference lithography. HMBIL will retain the compelling advantages of multibeam interference lithography, such as deeply sub-wavelength resolution and high-throughput patterning. The project will develop a prototype system to enable patterning of arbitrarily-shaped 100 nm feature sizes over large areas (wafer scale) with high throughput (>25 cm2 device area in under 1 hour), a combination which is currently unachievable with direct-write processes.