Holographic Interference Lithography for Microbattery Applications

该项目将开发一种新的无掩模光刻系统，“全息多光束干涉光刻（HMBIL）”，能够实现大面积，动态可重构的纳米级图案，具有亚波长（光学）分辨率，高吞吐量，并且成本至少比竞争对手电子束光刻低一个数量级。这种制造具有纳米级特征的复杂图案的能力将使下一代微型电池的制造成为可能。在这个博士项目中，我们将应用全息干涉光刻技术来制造具有纳米孔的互指锂离子微电池，以实现快速动力学。拟议的光刻系统将结合干涉光刻方法（在midi项目中演示）和之前在剑桥演示的无掩模全息光刻系统。在HMBIL中，光束将在干涉之前被全息预成型，这将使我们能够形成任意的图案，而不是干涉光刻通常可以实现的完美周期性图案。HMBIL将保留多波束干涉光刻的优势，如深度亚波长分辨率和高通量图像化。该项目将开发一个原型系统，以实现在大面积（晶圆规模）上任意形状的100纳米特征尺寸的图案，并具有高吞吐量（在1小时内达到25平方厘米的器件面积），这是目前直接写入工艺无法实现的组合。

This project will develop a new maskless lithography system, "holographic multibeam interference lithographe (HMBIL)" capable of large-area, dynamically-reconfigurable nanoscale patterning, with sub-wavelength (optical) resolution, high throughput, and at least an order of magnitude lower cost than competing electron-beam lithography. This ability to create complex patterns with nanoscale features will enable the fabrication of next generation microbatteries. In this PhD project we will apply holographic interference lithography to create interdigitated Li-Ion microbatteries with nanopores for fast kinetics. The proposed lithography system will combine the interference lithography approach (demonstrated in the midi project) with the maskless holographic lithography systems previously demonstrated in Cambridge. In HMBIL, beams will be holographically pre-shaped prior to interference, which will allow us to form arbitrary patterns beyond the perfectly periodic patterns normally achievable with interference lithography. HMBIL will retain the compelling advantages of multibeam interference lithography, such as deeply sub-wavelength resolution and high-throughput patterning. The project will develop a prototype system to enable patterning of arbitrarily-shaped 100 nm feature sizes over large areas (wafer scale) with high throughput (>25 cm2 device area in under 1 hour), a combination which is currently unachievable with direct-write processes.