Laser Interference Lithography based 4D-printing of Nanomaterials

基于激光干涉光刻的纳米材料 4D 打印

基本信息

  • 批准号:
    EP/X038203/1
  • 负责人:
  • 金额:
    $ 15.66万
  • 依托单位:
  • 依托单位国家:
    英国
  • 项目类别:
    Research Grant
  • 财政年份:
    2023
  • 资助国家:
    英国
  • 起止时间:
    2023 至 无数据
  • 项目状态:
    未结题

项目摘要

By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks, producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of 4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to battery performance/life. The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments
通过解决目前纳米材料4D打印的局限性,该项目试图启动一种新的工艺范例,基于激光干涉光刻(LIL)的4D打印,以快速和准确地生产真正的3D结构和大容量的4D纳米材料。它结合了激光干涉光刻机的优势和先进的智能油墨,产生了最先进的4D纳米材料制造能力。这一新方法对4D纳米材料的大规模生产和纳米材料的市场推广具有潜在的意义。在我们的方法中,应用了LIL图案化,并将图案缝合成真正的3D纳米结构,然后执行智能墨水的渗透。该方法基于一些既定的原则和在该联盟内获得的现有技术,但仍有待进一步探索。该项目在3D图案化和纳米计量学、4D纳米材料的生物活性毒性和微结构对电池性能/寿命的影响方面创造了新的知识。研究和创新的目标是将体积激光干涉光刻扫描和深度曝光相结合,以实现快速、准确、真正的3D结构制造,基于最先进的纳米计量学和表征技术,开发干涉图案单元和跨图案层之间的最佳对准,以精确形成大体积3D纳米结构,并实现可控渗透,以形成第四维纳米材料。这项新技术将在生物医学和工程应用方面开创先河。这些目标雄心勃勃,需要国际层面的合作。该项目通过在财团成员和其他成员之间启动一个长期合作平台来解决这些合作问题。它还通过各种联合研究和创新和培训活动,特别是精心安排的借调,强调工作人员的发展。

项目成果

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Dayou Li其他文献

Effect of fullerenol on the morphology features of SW480 cells
富勒烯醇对SW480细胞形态特征的影响
Oblique fringe measurement by pattern correlation
通过图案相关测量斜条纹
Collaborative Agent System Using Fuzzy Logic for Optimisation
使用模糊逻辑进行优化的协作代理系统
  • DOI:
    10.1007/3-540-36559-1_16
  • 发表时间:
    2002
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Dayou Li;Jie Zhang
  • 通讯作者:
    Jie Zhang
Biomimetic moth-eye structures fabricated by double-exposure lithography using coplanar three-beam laser interference
  • DOI:
    10.1007/s00340-025-08474-3
  • 发表时间:
    2025-05-09
  • 期刊:
  • 影响因子:
    2.000
  • 作者:
    Litong Dong;Xiangyu Li;Mengnan Liu;Lu Wang;Zuobin Wang;Dayou Li
  • 通讯作者:
    Dayou Li
Towards robust personal assistant robots: Experience gained in the SRS project
迈向强大的个人助理机器人:SRS 项目中获得的经验
  • DOI:
    10.1109/iros.2012.6385727
  • 发表时间:
    2012
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Renxi Qiu;Ze Ji;Alexandre Noyvirt;A. Soroka;R. Setchi;D. Pham;Shuo Xu;Nayden Shivarov;L. Pigini;Georg Arbeiter;Florian Weisshardt;B. Graf;Marcus Mast;Lorenzo Blasi;D. Facal;M. Rooker;Rafa López;Dayou Li;Beisheng Liu;G. Kronreif;P. Smrz
  • 通讯作者:
    P. Smrz

Dayou Li的其他文献

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{{ truncateString('Dayou Li', 18)}}的其他基金

Emerging nanoscopy for single entity characterisation
用于单一实体表征的新兴纳米技术
  • 批准号:
    EP/X038211/1
  • 财政年份:
    2023
  • 资助金额:
    $ 15.66万
  • 项目类别:
    Research Grant

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基于非分裂神经元系统的CRISPR interference作用机制及应用研究
  • 批准号:
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  • 批准年份:
    2017
  • 资助金额:
    65.0 万元
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基于激光干涉光刻的纳米材料 4D 打印
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    EP/X038025/1
  • 财政年份:
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超越直写:用于高通量纳米制造的动态可重构全息多束干涉光刻
  • 批准号:
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  • 批准号:
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  • 财政年份:
    2021
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In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
原位干涉光刻:一种生产纳米结构阵列的新制造方法
  • 批准号:
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Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
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