Laser Interference Lithography based 4D-printing of Nanomaterials

基于激光干涉光刻的纳米材料 4D 打印

基本信息

  • 批准号:
    EP/X038025/1
  • 负责人:
  • 金额:
    $ 25.26万
  • 依托单位:
  • 依托单位国家:
    英国
  • 项目类别:
    Research Grant
  • 财政年份:
    2023
  • 资助国家:
    英国
  • 起止时间:
    2023 至 无数据
  • 项目状态:
    未结题

项目摘要

By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks, producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of 4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to battery performance/life. The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments
通过解决当前纳米材料 4D 打印的局限性,该项目旨在开创一种新的工艺范例,即基于激光干涉光刻 (LIL) 的 4D 打印,以快速、准确地生产真正的 3D 结构和大体积 4D 纳米材料。它通过将激光干涉光刻的优势与先进的智能墨水相结合来实现这一目标,产生最先进的4D纳米材料制造能力。这种新方法具有大规模生产4D纳米材料和纳米材料进入市场的潜力。在我们的方法中,应用 LIL 图案并将图案缝合以形成真正的 3D 纳米结构,然后进行智能墨水的渗透。该方法基于联盟内获得的一些既定原则和现有技术,但仍有待进一步探索。该项目为 3D 图案化和纳米计量学、4D 纳米材料的生物活性毒性以及微结构对电池性能/寿命的影响创造了有关 LIL 和超透镜的新知识。研究和创新的目标是集成体积激光干涉光刻扫描和深度曝光,以实现快速、准确、真正的 3D 结构制造,基于最先进的纳米计量学和表征,开发干涉图案单元之间和图案层之间的最佳对准,以准确形成大体积 3D 纳米结构,并实现受控渗透,以形成第四维纳米结构。 纳米材料。该新技术将在生物医学和工程应用领域处于领先地位。这些目标雄心勃勃,需要国际层面的合作。该项目通过在联盟成员及其他成员之间启动长期合作平台来解决合作问题。它还通过各种联合研究、创新和培训活动强调员工发展,特别是精心安排的借调

项目成果

期刊论文数量(3)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Preparation of Micro Gripper Pincer End with Bionic Superhydrophobic Surface and Analysis of Gripping Performance
The effects of carbon ion implantation on wettability, abrasion, thermal and anti-corrosion stabilities of laser ablated super-hydrophobic Nitinol surface
  • DOI:
    10.1016/j.jmrt.2023.12.078
  • 发表时间:
    2023-12
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Meng Wang;Chengjuan Yang;Zhen Yang;Yanling Tian
  • 通讯作者:
    Meng Wang;Chengjuan Yang;Zhen Yang;Yanling Tian
Laser-induced Zinc Metal Battery Anodes with Ultra-long Cycling Performance
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Yanling Tian其他文献

A unified element stiffness matrix model for variable cross-section flexure hinges in compliant mechanisms for micro/nano positioning
微纳定位顺应机构中变截面柔性铰链的统一单元刚度矩阵模型
  • DOI:
    10.1007/s00542-019-04410-6
  • 发表时间:
    2019-03
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Yanling Tian;Mingxuan Yang;Fujun Wang;Chongkai Zhou;Xingyu Zhao;Dawei Zhang
  • 通讯作者:
    Dawei Zhang
Investigation on Modeling and Formation Mechanism of Dynamic Rotational Error for Spindle-Rolling Bearing System
主轴滚动轴承系统动态旋转误差建模及形成机制研究
  • DOI:
    10.3390/app10175753
  • 发表时间:
    2020-08
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Gaofeng Hu;Ye Chen;Liangyu Cui;Gang Jin;Tingjian Wang;Houjun Qi;Yanling Tian
  • 通讯作者:
    Yanling Tian
MODELING OF PRECISION GRINDING PROCESS BASED ON MICRO- POSITIONING TABLE AND ERROR COMPENSATION TECHNOLOGY
Fabrication of polymer optical diffusers by buffer-assisted ultrasonic embossing
通过缓冲辅助超声压印制造聚合物光学漫射器
Investigation of the mechanical effects of targeted drugs on cancerous cells based on atomic force microscopy.
基于原子力显微镜研究靶向药物对癌细胞的机械效应。

Yanling Tian的其他文献

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{{ truncateString('Yanling Tian', 18)}}的其他基金

Laser Engineered Surfaces/Interfaces for Advanced Batteries
用于先进电池的激光工程表面/界面
  • 批准号:
    EP/Y036727/1
  • 财政年份:
    2024
  • 资助金额:
    $ 25.26万
  • 项目类别:
    Research Grant
NanoRAM: Emerging Nanotools for Soft Matter Characterisation and Manipulation
NanoRAM:用于软物质表征和操纵的新兴纳米工具
  • 批准号:
    EP/Y032306/1
  • 财政年份:
    2024
  • 资助金额:
    $ 25.26万
  • 项目类别:
    Research Grant
Emerging nanoscopy for single entity characterisation
用于单一实体表征的新兴纳米技术
  • 批准号:
    EP/X038017/1
  • 财政年份:
    2023
  • 资助金额:
    $ 25.26万
  • 项目类别:
    Research Grant

相似国自然基金

基于非分裂神经元系统的CRISPR interference作用机制及应用研究
  • 批准号:
    31771482
  • 批准年份:
    2017
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Laser Interference Lithography based 4D-printing of Nanomaterials
基于激光干涉光刻的纳米材料 4D 打印
  • 批准号:
    EP/X038203/1
  • 财政年份:
    2023
  • 资助金额:
    $ 25.26万
  • 项目类别:
    Research Grant
Beyond direct-write: Dynamically reconfigurable holographic multibeam interference lithography for high-throughput nanomanufacturing
超越直写:用于高通量纳米制造的动态可重构全息多束干涉光刻
  • 批准号:
    2719982
  • 财政年份:
    2022
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Beyond direct-write: Dynamically reconfigurable holographic multibeam interference lithography for high-throughput nanomanufacturing
超越直写:用于高通量纳米制造的动态可重构全息多束干涉光刻
  • 批准号:
    EP/V055003/1
  • 财政年份:
    2022
  • 资助金额:
    $ 25.26万
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Holographic Interference Lithography for Microbattery Applications
用于微电池应用的全息干涉光刻
  • 批准号:
    2606929
  • 财政年份:
    2021
  • 资助金额:
    $ 25.26万
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    Studentship
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
原位干涉光刻:一种生产纳米结构阵列的新制造方法
  • 批准号:
    EP/P027822/1
  • 财政年份:
    2017
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    $ 25.26万
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    Research Grant
Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
通过三维纳米级干涉光刻制造的工程光学和流体设备的材料系统
  • 批准号:
    418611-2013
  • 财政年份:
    2017
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    $ 25.26万
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    Discovery Grants Program - Individual
Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
通过三维纳米级干涉光刻制造的工程光学和流体设备的材料系统
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通过三维纳米级干涉光刻制造的工程光学和流体设备的材料系统
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    418611-2013
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    Discovery Grants Program - Individual
Materials systems for engineering optical and fluidic devices fabricated via three-dimensional nanoscale interference lithography
通过三维纳米级干涉光刻制造的工程光学和流体设备的材料系统
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    418611-2013
  • 财政年份:
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    Discovery Grants Program - Individual
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通过三维纳米级干涉光刻制造的工程光学和流体设备的材料系统
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    2013
  • 资助金额:
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