Modelling of Carrier Transport in Ultra Thin Body Transistors
Modelling of Carrier Transport in Ultra Thin Body Transistors
批准号:
EP/D070236/1
负责人:
Karol Kalna
金额:
$66.92万
依托单位:
依托单位国家:
英国
项目类别:
Fellowship
财政年份:
2007
资助国家:
英国
项目状态:
已结题
起止时间:
2007 至 --
中文摘要
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英文摘要
Aggressive scaling of the conventional metal-oxide-semiconductor field effect transistors is required by the International Technology Roadmap for Semiconductors as conventional devices will hit a limit beyond the 45 nm technology node. Novel, ultra-thin body transistors must be introduced into production in order to sustain the expected increase in device performance. Moreover, both the Silicon device body and the SiO2 dielectric have to be replaced with a higher mobility semiconductor and higher dielectric constant materials.The proposed fellowship research aims to develop a 'state-of-art' Monte Carlo device simulator which is capable of accurately modelling the low-dimensional properties of ultra-thin body transistors. The simulator will be employed to optimise the ultra-thin body architecture, to benchmark the prospective high mobility materials, and to investigate the impact of high-K dielectrics on channel mobility. It will also focus on the exploitation of different material crystal orientations in the channel. The accompanying research grant proposal aims to establish a new Monte Carlo simulation tool and enhancing the collaborators' Non-Equilibrium Green Functions simulator employed in the investigation of nanowire transistors.
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MOSFETs: Properties, Preparations & Performance
MOSFET:特性、制备
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[Andre Noah T]
通讯作者:
Andre Noah T
MONTE CARLO SIMULATIONS OF In 0.75 Ga 0.25 As MOSFETs AT 0.5 V SUPPLY VOLTAGE FOR HIGH-PERFORMANCE CMOS
高性能 CMOS 在 0.5 V 电源电压下 In 0.75 Ga 0.25 As MOSFET 的蒙特卡洛模拟
DOI:
10.1142/s0129156409006126
发表时间:
2011
期刊:
International Journal of High Speed Electronics and Systems
影响因子:
--
作者:
[AYUBI-MOAK J]
通讯作者:
AYUBI-MOAK J
Effect of interface state trap density on the characteristics of n-type, enhancement-mode, implant-free In0.3Ga0.7As MOSFETs
界面态陷阱密度对 n 型、增强型、无注入 In0.3Ga0.7As MOSFET 特性的影响
DOI:
10.1016/j.mee.2009.03.024
发表时间:
2009
期刊:
Microelectronic Engineering
影响因子:
2.3
作者:
[Ayubi-Moak J]
通讯作者:
Ayubi-Moak J
DOI:
10.1002/pssc.200880858
发表时间:
2009-06
期刊:
Physica Status Solidi (c)
影响因子:
--
作者:
[D. Baláž;K. Kalna;Martin Kuball;M. Uren;A. Asenov]
通讯作者:
D. Baláž;K. Kalna;Martin Kuball;M. Uren;A. Asenov
Impurity potential induced resonances in doped Si nanowire: A NEGF approach
掺杂硅纳米线中的杂质电势诱导共振:NEGF 方法
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[Antonio Martinez (Author)]
通讯作者:
Antonio Martinez (Author)
Multiscale Modelling of Metal-Semiconductor Contacts for the Next Generation of Nanoscale Transistors
-
批准号:EP/I010084/1
-
项目类别:Research Grant
-
资助金额:$36.95万
-
财政年份:2011
-
负责人:Karol Kalna
-
依托单位:
Modelling of Carrier Transport in Ultra Thin Body Transistors
-
批准号:EP/D070236/2
-
项目类别:Fellowship
-
资助金额:$0.0万
-
财政年份:2010
-
负责人:Karol Kalna
-
依托单位:
国内基金
海外基金
基于"Carrier-free"概念构建的高载药量的主动靶向双药纳米纤维递药体系的疗效评价及机制研究
-
批准号:81472781
-
项目类别:面上项目
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资助金额:74.0万元
-
批准年份:2014
-
负责人:李晓林
-
依托单位: