The Study of Magnetized Electronegative Depositing Plasmas

磁化负电沉积等离子体的研究

• 批准号: EP/E035183/1
• 负责人: James Bradley
• 金额: $ 47.29万
• 依托单位: University of Liverpool
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2007
• 资助国家: 英国
• 起止时间: 2007 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FE035183%2F1
• 关键词: Study; Magnetized; Electronegative; Depositing; Plasmas

The importance of electronegative species in technological plasmas is currently of great interest, both from a theoretical and experimental point of view, with much of the recent work concentrating on reactive ion etching discharges.However, other very important plasma systems have been somewhat neglected by scientist and engineers in terms of the role of negative ions, for instance, pulsed magnetized discharges (the sputter magnetron) used for the reactive deposition of thin films which contain electronegative gases such as oxygen. In this project, we will perform the first detailed study of the role of negative ions on the structure and dynamics of the pulsed magnetron plasma. In particular, it is our aim to make quantitative temporal and spatial measurements of the concentrations, energies and fluxes of electronegative species such as O- and O2- in the magnetron. The experimental study will be supplemented by modelling activity necessary to fully understand and interpret our diagnostic tools and shed light on the fundamental physical processes. The plasma measurements will be useful in understanding thin film growth dynamics and the fundamental data can be used in other more surface engineering orientated projects.

从理论和实验的角度来看，电负性物种在技术等离子体中的重要性目前都引起了极大的兴趣，最近的大部分工作集中在反应离子蚀刻放电上。然而，科学家和工程师在负离子的作用方面有些忽视了其他非常重要的等离子体系统，例如，脉冲磁化放电（溅射磁控管），用于反应沉积含有负电性气体（如氧气）的薄膜。在这个项目中，我们将进行第一个详细的研究负离子的作用的结构和动力学的脉冲磁控管等离子体。特别是，它是我们的目标，使定量的时间和空间测量的浓度，能量和电负性物种，如O-和O2-在磁控管的通量。实验研究将通过充分理解和解释我们的诊断工具并揭示基本物理过程所需的建模活动来补充。等离子体测量将有助于了解薄膜生长动力学和基础数据可以用于其他更多的表面工程导向的项目。

项目成果

Resonance hairpin and Langmuir probe-assisted laser photodetachment measurements of the negative ion density in a pulsed dc magnetron discharge

• DOI: 10.1116/1.3580934
• 发表时间: 2011-04
• 期刊: Journal of Vacuum Science and Technology
• 作者: J. Bradley;R. Dodd;S. You;N. Sirse;S. Karkari

Negative Ion Density Measurements in Reactive Magnetron Sputtering

反应磁控溅射中的负离子密度测量

• DOI: 10.1002/ppap.200931606
• 发表时间: 2009
• 期刊: Plasma Processes and Polymers
• 影响因子: 3.5
• 作者: Dodd R

Optimum circuit design for the detection of laser photodetachment signals

• DOI: 10.1088/0963-0252/22/1/015014
• 发表时间: 2012-12
• 期刊: Plasma Sources Science and Technology
• 影响因子: 3.8
• 作者: P. Bryant;J. Bradley