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Low frequency noise to study the quality of novel devices

用于研究新型设备质量的低频噪声

基本信息

批准号：
EP/F044666/1
负责人：
Kristel Fobelets
金额：
$ 3.49万
依托单位：
Imperial College London
依托单位国家：
英国
项目类别：
Research Grant
财政年份：
2007
资助国家：
英国
起止时间：
2007 至无数据
项目状态：
已结题

来源：
https://gtr.ukri.org/projects?ref=EP%2FF044666%2F1
关键词：
Low frequency noise study quality

项目摘要

During the development of novel semiconductor devices different topics need to be explored such as the physics behind the device operation, the material quality from which the devices are constructed, the fabrication technology required and the characterisation techniques that will give a better insight into the operation of the devices. The latter gives feedback into the optimisation process aimed towards a successful device. Experimental evaluation of the device can be split in two different categories, one is the evaluation of the material from which the devices will be made and the other one is via electrical or optical measurements on the fabricated devices themselves. Although material characterisation is the essential first step in the development of devices, one should not disregard that fabrication technology itself can impact on the material quality and thus potentially degrade the device performance. Expertise on many of the electrical characterisation techniques are available in the group, however expert know-how on the low frequency noise measurement technique to study the quality of the material is lacking. This techniques offers interesting extra opportunities as there exists a correlation between the occurrence of defects in the material and the low frequency noise in the device. Thus, via an analysis of the noise spectrum, possibly as a function of temperature, different defects that occur in the active device can be characterised. Once the traps are characterised an analysis of the reason for their occurrence can be made and the device can be improved based on the conclusions, or different devices can be compared.

在新型半导体器件的开发过程中，需要探索不同的主题，例如器件操作背后的物理学、构造器件的材料质量、所需的制造技术以及能够更好地了解器件操作的表征技术。后者为优化过程提供反馈，旨在获得成功的设备。设备的实验评估可以分为两个不同的类别，一个是评估的材料，从该设备将被制成，另一个是通过电气或光学测量制造的设备本身。虽然材料表征是器件开发的重要第一步，但不应忽视制造技术本身会影响材料质量，从而可能降低器件性能。该小组拥有许多电气特性技术方面的专业知识，但缺乏研究材料质量的低频噪声测量技术方面的专业知识。这种技术提供了有趣的额外机会，因为材料中缺陷的发生与器件中的低频噪声之间存在相关性。因此，通过分析噪声频谱，可能作为温度的函数，可以表征有源器件中出现的不同缺陷。一旦陷阱被表征，就可以对其发生的原因进行分析，并且可以基于结论来改进设备，或者可以比较不同的设备。