Rapid thermal annealing (RTA) system for advanced CMOS, MEMs, and polymer-based materials and devices

点击翻译按钮获取中文摘要

Dimensional scaling of many different types of materials and devices has been required to continue to meet the demands of the ever-increasing performance requirements. To produce advanced materials and devices, precise control on the scale of individual atoms is required. This type of control is required for many research areas, including, advanced silicon-based materials and devices, polymer-based devices for memory and sensor applications, micro-electro-mechanical systems (MEMS), photonic bandgap materials and devices, etc.. It is the acquisition of a Rapid Thermal Annealing (RTA) system that is the focus of this proposal. The RTA system is required for material and device fabrication to maintain precise control of temperature, ambient and timescales (seconds) where tradition thermal furnaces cannot be used.