Engineering Research Equipment Grant: Rapid Thermal Annealing Facility

使用非相干光源对注入的半导体进行短期退火法目前得到了广泛的应用。本研究旨在建立卤素灯快速热退火系统。该系统将用于正在进行的实验，旨在了解基本工艺及其优化，并用于器件制造。后者包括微波和光电子器件。在实验室中提供这样的系统将使在不同领域进行更广泛的研究。

Short-term annealing of implanted semiconductors using incoherent light sources is currently being widely used. This research is concerned with the establishment of a halogen lamp rapid thermal annealing system. The system will be used in ongoing experiments aimed at the understanding of the basic process and its optimization and in device fabrication. The latter includes both microwave and optoelectronic devices. The availability of such a system in the laboratory will enable more extensive studies in the various areas.