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Engineering Research Equipment Grant: Rapid Thermal Annealing Facility

Engineering Research Equipment Grant: Rapid Thermal Annealing Facility
工程研究设备补助金：快速热退火设备
批准号：
8505833
负责人：
Pallab Bhattacharya
金额：
$2.0万
依托单位：
Regents of the University of Michigan - Ann Arbor
依托单位国家：
美国
项目类别：
Standard Grant
财政年份：
1985
资助国家：
美国
项目状态：
已结题
起止时间：
1985-08-01 至 1986-07-31
来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=8505833&HistoricalAwards=false
关键词：
EngineeringResearchEquipmentGrantRapid

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英文摘要
Short-term annealing of implanted semiconductors using incoherent light sources is currently being widely used. This research is concerned with the establishment of a halogen lamp rapid thermal annealing system. The system will be used in ongoing experiments aimed at the understanding of the basic process and its optimization and in device fabrication. The latter includes both microwave and optoelectronic devices. The availability of such a system in the laboratory will enable more extensive studies in the various areas.
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  • 批准号：
    24ZR1403900
  • 项目类别：
    省市级项目
  • 资助金额：
    --
  • 批准年份：
    2024
  • 负责人：
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  • 依托单位：
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