Optical process control for plasma-assisted deposition of functional nanoelectronic thin films

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With the goal to establish a technology transfer from research grade deposition tools to industrial scale for the deposition of functional nanoelectronic thin films, we target sputter deposition for a novel multiferroic material, Bi2FeCrO6, which has so far been synthesized by pulsed laser deposition. This transfer has shown to require additional process control regarding the film growth. In order to establish an in-situ control technique that can possibly sell as a complementary toolbox for sputtering devices, we will investigate the potential of optical spectroscopy techniques including second harmonic generation and Raman scattering to monitor the properties of the material during growth in a pulsed sputtering scheme. The two industrial partners are specialized in sputter tools and in the synchronization of optical detection respectively. The research team is composed of specialists in thin film growth, ferroelectrics and optical spectroscopy, which combines all necessary expertise in this three-year project. The intense implication and training of highly qualified personnel is the key to meeting all milestones in due time, we therefore dedicate almost all budget to salaries and training. The proof of concept and a first demonstration of in-situ characterization will not only have our industrial partners benefit immediately but will also create a better understanding of an enabling technology for thin films in electronic industries with a broader impact that reaches beyond the team partners.