Optical process control for plasma-assisted deposition of functional nanoelectronic thin films

功能纳米电子薄膜等离子体辅助沉积的光学过程控制

• 批准号: 452311-2013
• 负责人: Ruediger, Andreas
• 金额: $ 2.91万
• 依托单位: Institut national de la recherche scientifique
• 依托单位国家: 加拿大
• 项目类别: Collaborative Research and Development Grants
• 财政年份: 2014
• 资助国家: 加拿大
• 起止时间: 2014-01-01 至 2015-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=554808
• 关键词: Optical; process; control; plasma; assisted

With the goal to establish a technology transfer from research grade deposition tools to industrial scale for the deposition of functional nanoelectronic thin films, we target sputter deposition for a novel multiferroic material, Bi2FeCrO6, which has so far been synthesized by pulsed laser deposition. This transfer has shown to require additional process control regarding the film growth. In order to establish an in-situ control technique that can possibly sell as a complementary toolbox for sputtering devices, we will investigate the potential of optical spectroscopy techniques including second harmonic generation and Raman scattering to monitor the properties of the material during growth in a pulsed sputtering scheme. The two industrial partners are specialized in sputter tools and in the synchronization of optical detection respectively. The research team is composed of specialists in thin film growth, ferroelectrics and optical spectroscopy, which combines all necessary expertise in this three-year project. The intense implication and training of highly qualified personnel is the key to meeting all milestones in due time, we therefore dedicate almost all budget to salaries and training. The proof of concept and a first demonstration of in-situ characterization will not only have our industrial partners benefit immediately but will also create a better understanding of an enabling technology for thin films in electronic industries with a broader impact that reaches beyond the team partners.

为了建立从研究级沉积工具到工业规模的技术转移，以沉积功能性纳米电子薄膜，我们对一种新型多铁性材料Bi2FeCrO 6进行了靶向溅射沉积，该材料迄今为止已通过脉冲合成激光沉积。这种转移已经表明需要关于膜生长的附加工艺控制。为了建立一个原位控制技术，可能会出售作为溅射设备的补充工具箱，我们将调查光谱技术，包括二次谐波产生和拉曼散射的潜力，以监测在脉冲溅射计划的生长过程中的材料的性能。这两家工业合作伙伴分别专注于溅射工具和光学检测同步。该研究团队由薄膜生长、铁电体和光谱学方面的专家组成，在这个为期三年的项目中结合了所有必要的专业知识。高素质人员的密集培训是按时达到所有里程碑的关键，因此我们几乎将所有预算用于工资和培训。概念验证和首次现场表征演示不仅将使我们的工业合作伙伴立即受益，而且还将更好地了解电子行业薄膜的使能技术，其影响范围超出团队合作伙伴。