Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing
Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing
批准号:
DGECR-2018-00262
负责人:
AlJanaideh, Mohammad
金额:
$0.91万
依托单位国家:
加拿大
项目类别:
Discovery Launch Supplement
财政年份:
2018
资助国家:
加拿大
项目状态:
已结题
起止时间:
2018-01-01 至 2019-12-31
中文摘要
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英文摘要
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会议论文
Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing
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Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing
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Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing
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Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing
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Precision Motion Stages for Enhancing the Performance of Lithography in Semiconductor Manufacturing
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海外基金