Market Assessment of a spatial atomic layer deposition system

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University of Waterloo researchers have developed a new atmospheric pressure spatial atomic layer deposition (AP-SALD) system that is able to deposit conformal, nanoscale films with a resolution of less than 1 nm (nanometre, a billionth of a metre). Films with thicknesses of a few nm or tens of nm can be deposited. The invention's high throughput and elimination of high operational and capital equipment costs provide a significant advantage over existing thin film deposition technologies used across a broad range of market sectors. The ability to deposit a wide range of materials onto varying substrate types, thicknesses and geometries provides for potential use within a range of applications including:- Thin film electronics (memory devices, logic chips, power electronics, display technologies, smart fabric, smart windows, etc.)- Energy storage/generation (batteries, fuel cells, solar cells, thermoelectrics, etc.)- Flexible electronics and sensors within the automotive, environment and medtech sectors- Emerging MEMS/NEMS and nanotube/nanowire devices The development of these technologies in Canada will lead to job creation and advancements in the green energy, internet-of-things, and medical device sectors that will benefit all Canadians. In this project, a Market Assessment will be performed by the consultant Foresight Science & Technology Inc. to assess the commercial opportunities for this invention and identify possible market entry strategies. Both primary and secondary market research will be used to identify, define and prioritize the applicable markets, provide an assessment of the identified markets' "Unmet Need" and analyze the competitive space/value-added proposition. The final report will be a valuable resource and will be relied upon for future decisions regarding commercialization pathways and technology/product roadmaps.