Reactive Coating of Carbides by Simultaneous Ion Bombardment and Material Deposition

由于没有方便的碳离子源，传统的反应束辅助涂层（IBAD）在低温下很难进行。碳化物是非常有用的涂层材料，具有优异的硬度和优异的抗氧化性能。除了高温化学沉积或溅射外，如果有更多的沉积技术，碳化物涂层将在商业上得到更广泛的应用。提出了一种产生强烈的低能碳离子束的方法，该方法特别适合于碳化物的反应性IBAD涂层。一般技术将演示使用碳化硅涂层。

Reactive beam assisted coating (IBAD) of carbides at low temperatures is difficult with conventional IBAD hardware because no convenient ion source of carbon exists. Carbides are very useful coating materials with superior hardness properties and in the case of SiC, exceptional oxidation resistance. Carbide coating would be more widely used commercially if more deposition techniques other than high temperature chemical deposition or sputtering were available. A method is proposed to produce an intense low energy ion beam of carbon that is particularly well suited for reactive IBAD coating of carbides. The general technique will be demonstrated using a Silicon carbide coating.