Surface Crystallography from Backscattering and Recoiling of1-15keV Ions and Atoms

固体表面的原子结构和化学反应将被 研究了各种技术，利用脉冲束 动能从1到15千电子伏的离子。 所述组合物 表面的原子几何形状将被确定为结果 这些测量。 散射交叉的计算 表面模型的截面将增加几何形状， 在确定正确的表面结构的考虑。 的 感兴趣的膜将主要支撑在硅上（111） 表面。 吸附物种如银之间的相互作用 金、银、镓、银和磷 在最初的实验中确定;更复杂的电影将是 后来调查。 另一项研究将遵循一个过程， 化学反应，金催化氧化硅在低 温度，因为它发生在表面上。 离子散射 将对这些技术进行评估，以确定它们是否普遍有用 用于气体表面动力学的研究。

Atomic structures and chemical reactions in solid surfaces will be investigated with a variety of techniques that utilize pulsed beams of ions with kinetic energies from 1 to 15 keV. The composition and atomic geometry of the surfaces will be determined as a result of these measurements. Calculations of the scattering cross sections from models of the surfaces will augment geometrical considerations in determining the correct surface structures. The films of interest will be supported primarily on silicon(111) surfaces. The interactions between adsorbed species such as silver and gold, silver and gallium, and silver and phosphorus will be determined in initial experiments; more complex films will be investigated later. Another study will follow the course of a chemical reaction, the gold catalyzed oxidation of silicon at low temperatures, as it occurs on the surface. Ion scattering techniques will be evaluated to see if they can be generally useful for studies of gas-surface kinetics.