Technology for Ultra-High Precision Mechanical Metrology

小行星9500390 该奖项支持精密计量领域的一个新概念，即极紫外光学测量机（EUVOMM）。 当用于测量光学表面时，该系统的目标是直径范围为250 mm，横向精度为3.3 nm rms，深度范围为7.5 mm，深度精度为0.33 nm rms。 这可以通过几种精密工程和光学技术的设计和集成来实现：精确的运动控制，减少外差干涉测量中的系统误差，以及作为传感探针的原子力显微镜。 该奖项支持的任务包括：系统优化、弹性机构缩放研究以及分析结果在实验性高精度滑动驱动系统中的实施。 这项工作将补充，并在一定程度上得到支持，在劳伦斯利弗莫尔实验室的制造技术计划的工作。 该研究为紫外或软X射线衍射极限光学系统的研制和测试提供了技术基础。 这将为半导体工业的研究和制造带来新一代的仪器。 ***

9500390 Patterson This award supports a new concept in precision metrology, the Extreme Ultraviolet Optics Measuring Machine (EUVOMM). The goals for this system when used to measure optical surfaces are a diameter range of 250 mm with a lateral accuracy of 3.3 nm rms, and a depth range of 7.5 mm with a depth accuracy of 0.33 nm rms. This can be achieved using design and integration of several precision engineering and optical technologies: precise motion control, reduction of systematic errors in heterodyne interferometry, and atomic force microscopy as the sensing probe. The tasks supported by this award are: system optimization, study of the scaling of elastic mechanisms, and implementation of the analysis results in an experimental high-precision slide drive system. This work will complement, and is in part be supported by, work at Lawrence Livermore Lab's Manufacturing Technologies Program. This research will provide the technical basis for fabrication and testing of diffraction limited optical systems operating in the ultraviolet or soft x-ray region. This will lead to a new generation of instruments for research and fabrication in the semiconductor industry. ***