MRI: Acquisition of a Dual Beam Electron Beam/Focused Ion Beam System for Research and Education
MRI: Acquisition of a Dual Beam Electron Beam/Focused Ion Beam System for Research and Education
批准号:
0922992
负责人:
Gottfried Strasser
金额:
$109.64万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-09-01 至 2010-08-31
中文摘要
该提案描述了美国国家科学基金会(NSF)主要研究仪器(MRI)支持在纽约州立大学布法罗大学(UB)获得双束SEM/FIB(扫描电子显微镜/聚焦离子束)系统的请求。该仪器将并入UB的INS(集成纳米结构系统)仪器设施并由其管理。此次收购是由布法罗大学四个不同系(电气工程、化学与生物工程、物理和化学)的跨学科团队推动的。设想中的仪器将允许UB研究人员将他们的研究活动扩展到广泛的新应用领域。该仪器将能够全自动制备用于透射电子显微镜(TEM)的样品,结构和修饰表面,材料的深度蚀刻,定义器件以及以纳米级分辨率沉积金属和绝缘体。
英文摘要
0922992StrasserThis proposal describes a request for NSF Major Research Instrumentation (MRI) support for acquisition of a dual beam SEM/FIB (Scanning Electron Microscope / Focused Ion Beam) system at the University at Buffalo (UB), State University of New York (SUNY). The instrument would be incorporated into and managed by UB's INS (Integrated Nanostructured Systems) Instrumentation Facility. The acquisition is driven by an interdisciplinary group of UB faculty from four different departments (Electrical Engineering, Chemical & Biological Engineering, Physics, and Chemistry). The envisioned instrument will allow UB researchers to expand their research activities into a broad range of new applications. The proposed instrument will be capable of fully automated preparation of samples for transmission electron microscopy (TEM), structuring and modifying surfaces, deep etching of materials, defining devices and depositing both metals and insulators with nanoscale resolution.
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CCLI: First course in nanoelectronics for engineers
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批准号:0837670
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2009
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负责人:Gottfried Strasser
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依托单位:
海外基金