Dynamic Maskless Holographic Lithography
Dynamic Maskless Holographic Lithography
批准号:
0928353
负责人:
Daniel Cole
金额:
$30.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-08-15 至 2013-07-31
中文摘要
这项研究将开发一种新的光刻技术,称为动态无掩模全息光刻(DMHL),通过将全息图和空间光调制器与光刻相结合来实现无掩模光刻,以产生二维和三维图案。 这是光刻技术的一个新范例。 值得注意的是,该工艺不需要掩模,从而消除了制造步骤。 它提供了一种微(最终是纳米)光刻的方法,如果成功的话,将具有低运营成本,低资本投资,并且在工艺上灵活。 全息图在光刻中的应用提供了在三维空间中产生图案的机会,并且使用计算机控制它提供了灵活性和实时操纵光的能力,这是固定掩模无法做到的。 掩模组的高成本使得常规光刻超出了许多用户的范围;因此,需要灵活的无掩模光刻方法。 理想的光刻技术将包括低操作和资本成本、高保真度、工艺和材料的灵活性、在近平面或非平面表面上图案化的能力以及三维制造的能力。 在这项研究中开发的DMHL过程符合许多这些标准。 DMHL提供了光学,显微镜,纳米系统和光刻教育的新机会。 匹兹堡大学的RET项目未来可能会有一个潜在的合作项目,该项目将为高中教师带来MEMS工程和微制造,使科学和数学课堂上的学生受益。
英文摘要
This research will develop a new lithographic technique called dynamic maskless holographic lithography (DMHL) that achieves maskless lithography by combining holograms and spatial light modulators with photolithography to produce patterns in two and three dimensions. This is a new paradigm in photolithography. Significantly, this process does not require a mask, eliminating a manufacturing step. It provides an approach to micro (and eventually nano) lithography that, if successful, will have low operating costs, low capital investment, and would be flexible in process. The application of holograms to photolithography gives the opportunity to produce patterns in three dimensions, and controlling this using a computer provides flexibility and the ability to manipulate light in real-time, something that cannot be done with fixed masks. The high cost of mask-sets puts conventional lithography out of range for many users; as such, a maskless approach to lithography that is flexible is desirable. An ideal lithography technique would include low operating and capital cost, high fidelity, flexibility in process and materials, ability to pattern on near- or non-planar surfaces, and the ability to manufacture in three dimensions. The DMHL process developed in this research meets many of these criteria. DMHL provides new opportunities for education in optics, microscopy, nanosystems, and lithography. There is a potential future tie-in with an RET program at the University of Pittsburgh, which will bring MEMS engineering and microfabrication to high school teachers, benefiting students in the science and math classroom.
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资助金额:$75.89万
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项目类别:Standard Grant
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资助金额:$30.0万
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依托单位:
海外基金