Continuous Atmospheric Pressure Atomic Layer Deposition Process for Controlled Nanoscale Thin Film Coatings

这项研究的目的是为了扩大对常压下原子层沉积(ALD)操作的理解，为低成本高速镀膜开辟新的机会。制备电子器件薄膜涂层的新方法和改进的纺织材料对钝化和保护具有重要意义，并可以提供新的功能。大多数常见的方法与涂覆高表面积聚合物纤维所需的温度和产量不兼容。ALD是一种相对较新的涂层工艺，可以在与塑料兼容的低温下产生极好控制的涂层。ALD的一个缺点是，它通常需要将样品放在真空室中，这可能既昂贵又缓慢。这项工作具有广泛影响的潜力，因为它将为有机电子的纳米制造和非织造纤维表面稳定定义一种新的方法。这项工作将通过两名博士生的工作来推进发现。来自代表性不足群体的学生将被招募参加。将通过支持现有的共享用户设施和扩大北卡罗来纳州ALD反应堆的可用性来加强研究基础设施。PIS还将通过参加北卡罗来纳州立大学主办的年度活动向初中生和高中生介绍这些纳米技术概念。

The objective of this research project is to expand the understanding of Atomic layer deposition (ALD) operation at atmospheric pressure and open new opportunities for low cost high speed coating.New methods to produce thin film coatings for electronic devices and improved textile materials are important for passivation and protection, and can provide new function. Most common methods are not compatible with temperature and throughput needed for coating high surface area polymer fibers. ALD is a relatively new coating process that can produce extremely well controlled coatings at low temperatures compatible with plastics. One downside to ALD is that it generally requires samples to be placed in a vacuum chamber, which can be costly and slow. The work has the potential for broad impact because it will define a new methodology for nanomanufacturing of organic electronics and nonwoven fiber surface stabilization. The work will advance discovery through the work of two PhD graduate students. Students from underrepresented groups will be recruited to participate. Research infrastructure will be enhanced by supporting existing shared user facilities, and by expanding the availability of ALD reactors at NC State. The PIs will also introduce these Nanotechnology concepts to middle and high school students through their participation in annual NC State University sponsored events.