MRI: Acquisition of a versatile direct write micro patterning system for research and education

1040344奥斯汀集成微加工实验室（IML）是一个2,500平方英尺的10级洁净室在杨百翰大学（杨百翰大学）校园。它是一个开放的设施，可供任何与大学有关联的人免费使用。该设施支持外部和内部资助的研究项目，以及本科生和研究生动手教学实验室。其工具集专注于光子学、MEMS微流体和传感器等领域的微纳米制造工艺。可用的工艺包括光刻、薄膜沉积、化学机械平坦化、反应离子蚀刻和各种类型的计量。然而，许多当前的研究项目需要在非平面衬底上进行光刻，这是他们目前不具备的能力。其他项目需要在三维中进行写入，这也无法使用现有的仪器来完成。这项建议的目标是收购一个无掩模，三维直写微光刻系统，以解决这些关键的需求。直写光刻是一种革命性的新技术，其中使用光学成像而不是使用光掩模来图案化衬底。增加本提案中规定的这种仪器将为IML增加最先进的无掩模光刻能力，并补充现有的基础设施。

1040344AustinThe Integrated Microfabrication Laboratory (IML) is a 2,500 square foot Class 10 cleanroom on the Brigham Young University (BYU) campus. It is an open access facility that is freely available for use by anyone affiliated with the university. The facility supports externally- and internally-funded research projects, and both undergraduate and graduate hands-on instructional laboratories. Its toolset is focused on micro and nanofabrication processes for device fabrication in areas such as photonics, MEMS microfluidics, and sensors. The available processes include photolithography, thin film deposition, chemical-mechanical planarization, reactive ion etching, and various types of metrology. However, many current research projects require lithography on non-planar substrates, a capability they do not currently have. Other projects require writing in three dimensions, which also cannot be done using existing instrumentation. The goal of this proposal is the acquisition of a maskless, 3-dimensional direct-write microlithography system to address these critical needs. Direct-write lithography is a revolutionary new technique in which substrates are patterned using optical imaging rather than using photomasks. The addition of such an instrument as specified in this proposal would add state-of-the-art maskless lithography capability to the IML and complement existing infrastructure.