SNM: Atomically Precise, Defect Free, DNA Masks with Embedded Metrology

这笔赠款解决了半导体行业在创造下一代存储设备方面面临的技术和政策障碍。该赠款的目标是：(I)实现由合成DNA制造的原子精确的、无缺陷的图案的大批量制造，(Ii)使用在线光学技术来自我报告缺陷，以在大批量生产期间监控图案的质量控制，以及(Iii)创建一个政策框架，以指导可扩展纳米制造中的公私合作。如果成功，解决这些工业挑战将有助于：(A)验证分子自组装作为用于可扩展纳米制造的具有成本效益的制造过程，(B)建立用于可扩展纳米制造的新工艺技术，(C)在纳米尺度上克服半导体器件制造中的关键障碍，以及(D)解决大规模生产和使用DNA作为工程纳米材料的社会影响。这项研究还将促进爱达荷州的科学和工程的发现、创新和基于知识的整体繁荣。爱达荷州是EPSCoR州。

This grant addresses the technical and policy barriers confronted by the semiconductor industry in creating next generation memory devices. The objectives of the grant are to: (I) enable high-volume manufacturing of atomically-precise, defect-free patterns made from synthetic DNA, (II) self-report defects using an in-line optical technique to monitor the quality control of patterns during high-volume production, and (III) create a policy framework that guides public-private collaborations in scalable nanomanufacturing.If successful, solving these industrial challenges will help: (A) validate molecular self-assembly as a cost-effective manufacturing process for scalable nanomanufacturing, (B) establish novel process techniques for scalable nanomanufacturing, (C) overcome critical roadblocks in semiconductor device fabrication at the nanoscale, and (D) address societal implications of the large-scale production and use of DNA as an engineered nanomaterial. The research will also advance the discovery, innovation, and overall knowledge-based prosperity of science and engineering in Idaho, an EPSCoR State.