Amorphous-Phase Formation and Structure in Semiconductor Substrates following Swift Heavy-Ion Irradiation

这项建议与研究重点3：建设和改造澳大利亚工业的前沿技术以及优先目标：突破性科学、前沿技术和先进材料是一致的。我们试图推断和理解元素和二元半导体衬底在快速重离子辐照过程中的操作过程，并识别和测量由此产生的非晶相结构。我们的成果和相应的科学见解将扩大这些材料在先进技术中的适用性，提升国家研究形象，增加国内知识库，并培养出熟练的年轻科学家，以便在2007年投入使用时使用澳大利亚同步加速器。

This proposal is consistent with Research Priority 3: Frontier Technologies for Building and Transforming Australian Industries and the Priority Goals: Breakthrough Science, Frontier Technologies and Advanced Materials. We seek to deduce and understand the processes operative during swift heavy-ion irradiation of elemental and binary semiconductor substrates and identify and measure the resulting amorphous-phase structure. Our results and accompanying scientific insight will broaden the applicability of these materials in advanced technologies, enhance the national research profile, increase the domestic knowledge base and yield skilled, young scientists trained to utilize the Australian Synchrotron when commissioned in 2007.