impurity Diffusion in ultra high purity iron using non-reactive Aluminum and Silicon

用Al和Si元素的非放射性示踪剂研究了Al和Si在高纯和超高纯铁中的杂质扩散。用二次离子质谱仪、俄歇电子能谱、原子吸收分析、吸光度法和一般放电发射光谱等几种仪器分析方法测定了浓度分布。用吸光度法得到了Al在Fe中扩散的可靠渗透曲线，并确定了Arrhenius方程：D-1.4x10-6exp(-236kJmol^&lt；-1&gt；/rt)m^2S^-lt；-1&gt；-1&gt；D-1.4x10-6exp(-236kJmol^&lt；-1&gt；/RT)m^2S^&lt；-1&gt；沉积A1样品，除碳炉原子吸附分析和Grou放电发射光谱外，其他仪器分析都表明了Al在Fe中的渗透。用二次离子质谱仪和俄歇电子能谱研究发现，在A层与Fe的界面上发现了黄牛。结果表明，一般放电发射光谱可用于测量杂质扩散的穿透分布。

Impurity diffusion of A1 and Si in high purity and ultra high purity iron has been studied by using non-radioactive tracer of A1 and Si elements. Concentration profiles have been determined by using several kind of the instrumental analyses, namely, secondary ion mass spectrometer, Auge electron spectroscopy, atomic absorption analysis, absorptiometry and grou discharge emission spectroscopy. Reliable penetration profile has been obtained by the absorptiometry for the impurity diffusion of A1 in Fe, and determined the Arrhenius equation as follows ;D-1.4x10-6exp (-236kJmol^<-1>/RT) m^2S^<-1>D-1.4x10-6exp (-236kJmol^<-1>/RT) m^2S^<-1>As deposited A1 sample, the other instrumental analysis, except carbon furnace atomic adsorption analysis and Grou discharge emission spectroscopy, have shown the penetration of A1 in Fe. It has been found that oxen is recognized at interface between A llayer and Fe by the secondary ion mass spectrometer and Auge electron spectroscopy. It has been suggested that the grou discharge emission spectroscopy is useful to measure the penetration profile for the impurity diffusion.