Photo and nanoprpbe integrated lithography

这个项目已经进行，以集成光刻和纳米探针光刻的有机硅烷单层抗蚀剂膜的基础上，并开发一个高吞吐量的光刻工艺。1）光学光刻系统的研制利用172nm的准分子灯设计并制作了一套光刻系统。2）无显影抗蚀剂条件下检测印刷图形我们开发了一种技术，以便在不破坏图形的情况下，以高分辨率观察有机硅烷单层上的光学印刷图形。通过基于非接触原子力显微镜的表面电势测量，我们可以在优于100 nm的空间分辨率下发现所打印的图案。3）纳米探针绘制使用原子力显微镜，我们成功地在单层抗蚀剂上绘制了窄至20 nm的精细图案。

This project has been conducted in order to integrate photolithography and nanoprobe lithography on the basis of organosilane monolayer resist films and to develop a high throughput lithgraphy process. We have obtained the followting results.1) Development of an optical lithgraphy systemUsing an excimer lamp at 172 nm, an photolithograpy system was designed and constructed. We have suceeded in projecting a lines and spaces pattern at a resolution of 1 μm.2) Detection of photoprinted pattens without developing resistsWe have developed a technique in order to observe optically printed patterns on an organisilane monolayer with high resolution and without destroying the pattern. Through surface potential measurements based on non-contact atomic force microscopy, we could find the photoprinted patterns at a spacial resolucion better than 100 nm.3) Nanoprobe drawingUsing atomic force microscopy, we have suceeded in drawing fine patterns on the monolayer resist as narrow as 20 nm.