Development fo a New Formation Method of Functional Thin Films

1994年研究了感应耦合溅射机，并期望在高真空中实现非常快速的形成。这意味着它可以形成非常干净的薄膜，因为它的机制。尽管如此，这台机器也存在一些问题，如相互污染和自污染。这一现象的原因是靶粒子通过快门板绕道到达衬底和另一个靶上。这是一个致命的缺陷，机器形成的原子尺寸有序控制膜。研究了新的屏蔽材料和屏蔽机理，以减少互污染和自污染。为了减少污染，我们对一个还原线圈进行了改进，使用了1.0匝线圈。该线圈被证实产生稳定的还原等离子体。稀土磁体在靶表面产生高而均匀的磁场，提高了等离子体密度和溅射效率。该磁体使得在较高真空度下成膜成为可能，从而获得更清洁的膜。为提高维修方便性，对阴极形状进行了改造.我们将该设备应用于Fe-Si-H系统。研究了晶体结构对软磁材料磁性能的影响。氢诱导使薄膜晶粒粗大，磁性能得到细化。

The induction coupling sputtering machine was investigated at 1994 and was expected to give very fast formation in high vacuum. This means it can form very clean films cause of it mechanism. Although, there are some problems in this machine like mutual-and self-contamination. This phenomenon is explained that target particle comes on substrate and another target with a detour through a shutter plate. It is a fatal defect for the machine to form a atomic size order controlled film. We investigated new shield material and mechanism to reduce the mutul-and selfcontamination. We made improvement of a reduction coil to reduce contamination by using 1.0 turn coil. This coil is confirmed to generate stabilized reduction plasma. The rare earth magnet gives high and uniform magnetic field on target surface and increases plasma density and sputtering efficiency. This magnet makes possible to form films under higher vacuum and then get more clean films. To improve convenience of maintenance, we reformed the shape of cathode. We applied this machine on Fe-Si-H system. We investigated the effects of crystal structure on magnetic properties of soft magnetic materials. The hydrogen induction on films makes coarse crystal grain and gives refinement on magnetic properties.