Basic study on decomposition of air pollutants using synergetic effect between barrier discharge and VUV light
Basic study on decomposition of air pollutants using synergetic effect between barrier discharge and VUV light
批准号:
09555083
负责人:
SAKAI Yosuke
金额:
$8.0万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999
中文摘要
Investigation on decomposition of air pollutants, such as nitrogen dioxides,fluorocarbons (C - D27 - D2F - D216 - D2,(ci D23 D2F D27 D2) ci D23 D2N/(ci D24 D2F D24 D2) ci D23 D2N or ci D28 D2F D28 D2/c28 - D2F - D216 - D2O), volatile chemical compounds,change them into non-harmful substances前carried out using a hybrid method ofelectrical discharge and VUV light (172nm) irradiation. The discharge characteristics betweenbarrier and corona type has been simulated in order to design an efficient decomposing system andVUV light source. The results are shown as follows,1) NO D22 D2 with gas pressures between 1 and 3Torr was decomposed into N i D22 - D2 and O D22 - D2 by dc discharge, in addition,by irradiation of VUV light the decomposition speed was accelerated the synergetic effect for thedecomposition level and speed were confirmed by observation of the decomposed species by a gaschromatography, emission spectra from plasma and a quadrupole mass analysis.2…More) Fluorocarbons, C - D27 - D2F - D216 - D2,(C - D23 D2F D27 - D2) C - D23 - D2N/(C - D24 - D2F D24 - D2) C - D23 - D2N andc28 D2F D28 D2/ c28 D2F D216 D2O,were decomposed by dc and rf discharge plasma In this case no synergetic effect by VUV irradiationwas seen. In a plasma phase a various kind of species, such as CF, CF D22 - D2, CF D23 - D2,c22 D2F D23 D2, c22 D2F D25 D2, c23 D2F D23 D2, c23 D2F D25 D2,C - D23 D2F d - 26 D2were observed by a mass analysis method. Some of the fragments among them were found to be capturedon the electrode surface as a film.3 on the electrode surface it was seen by XPS spectra that thinfilm was composed of CF, CF D22 D2,CF D23 D2 and -C-CF D2x D2. The electrical properties of this film were fine,namely high electric strength and low dielectric constant.4) This result suggested that This filmwas applicable to interlayer insulation of integrated circuits and insulation of power apparatusThe barrier discharge for application of VUV and decomposition of pollutants was分析by a计算机模拟方法无
英文摘要
Investigation on decomposition of air pollutants, such as nitrogen dioxides, fluorocarbons (CィイD27ィエD2FィイD216ィエD2, (CィイD23ィエD2FィイD27ィエD2)ィイD23ィエD2N/(CィイD24ィエD2FィイD24ィエD2)ィイD23ィエD2N or CィイD28ィエD2FィイD28ィエD2/ CィイD28ィエD2FィイD216ィエD2O), volatile chemical compounds, etc. and change them into non-harmful substances has been carried out using a hybrid method of electrical discharge and VUV light (172nm) irradiation. The discharge characteristics between barrier and corona type has been simulated in order to design an efficient decomposing system and VUV light source. The results are shown as follows,1) NOィイD22ィエD2 with gas pressures between 1 and 3 Torr was decomposed into NィイD22ィエD2 and OィイD22ィエD2 by dc discharge, in addition, by irradiation of VUV light the decomposition speed was accelerated. The synergetic effect for the decomposition level and speed were confirmed by observation of the decomposed species by a gas chromatography, emission spectra from plasma and a quadrupole mass analysis.2 … More ) Fluorocarbons, CィイD27ィエD2FィイD216ィエD2, (CィイD23ィエD2FィイD27ィエD2)ィイD23ィエD2N/(CィイD24ィエD2FィイD24ィエD2)ィイD23ィエD2N and CィイD28ィエD2FィイD28ィエD2/CィイD28ィエD2FィイD216ィエD2O, were decomposed by dc and rf discharge plasma. In this case no synergetic effect by VUV irradiation was seen. In a plasma phase a various kind of species, such as CF, CFィイD22ィエD2, CFィイD23ィエD2, CィイD22ィエD2FィイD23ィエD2, CィイD22ィエD2FィイD25ィエD2, CィイD23ィエD2FィイD23ィエD2, CィイD23ィエD2FィイD25ィエD2, CィイD23ィエD2FィイD26ィエD2, were observed by a mass analysis method. Some of the fragments among them were found to be captured on the electrode surface as a film.3) On the electrode surface it was seen by XPS spectra that thin film was composed of CF, CFィイD22ィエD2, CFィイD23ィエD2 and -C-CFィイD2xィエD2. The electrical properties of this film were fine, namely high electric strength and low dielectric constant.4) This result suggested that this film was applicable to interlayer insulation of integrated circuits and insulation of power apparatus.5) The barrier discharge for application of VUV and decomposition of pollutants was analyzed by a computer simulation method. Less
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C.P.Lungu: "A Study on NO_2 Decomposition in a Low-Pressure Plasma and 172nm Xenon Excimer Lamp Radiation"Proc.4th Int.Conf.on Reactive Plasmas and 16th Symp.on Plasma Processing. 283-284 (1998)
C.P.Lungu:“低压等离子体和 172nm 氙准分子灯辐射中 NO_2 分解的研究”Proc.4th Int.Conf.on Reactive Plasmas 和 16th Symp.on Plasma Process。
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C. P. Lungu: "CxFy polymer film deposition in DC and RF fluorinert vapor plasmas"The Second International Symposium on Applied Plasma Sciences, Osaka, Japan, September 20-24, 1999. 253-260 (1999)
C. P. Lungu:“DC 和 RF 氟惰性蒸气等离子体中的 CxFy 聚合物薄膜沉积”第二届国际应用等离子体科学研讨会,日本大阪,1999 年 9 月 20-24 日。253-260 (1999)
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井上剛: "直流グロー放電と紫外光を用いたハイブリッド方式によるNOx分解" 電気学会全国大会. (発表予定). (1998)
Tsuyoshi Inoue:“使用直流辉光放电和紫外光的混合方法分解氮氧化物”,日本电气工程师学会全国会议(预定报告)(1998 年)。
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C.P.Lungu: "Fluorinated carbon films with low dielectric constant made from novel fluorocarbon source materials by RF plasma enhanced chemical vapor deposition"Jpn.J.Appl.Phys.. 38(12B). L1544-L1546 (1999)
C.P.Lungu:“通过射频等离子体增强化学气相沉积由新型氟碳源材料制成的低介电常数氟化碳膜”Jpn.J.Appl.Phys.. 38(12B)。
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G. Inoue, C.P. Lungu, A. Lungu, H. Sugawra. Y. Sakai: "Decomposition of NOィイD22ィエD2 by hybrid method of the DC discharge and the UV irradiation -effect of He, NィイD22ィエD2, OィイD22ィエD2 admixtures-"oc. Of 1999 Annual Conf. Of Fundamentals and Material Society
G. Inoue、C.P. Lungu、A. Lungu、H. Sugawra:“通过 DC 放电和 He、N-D22-D2、D22 的混合方法分解 NO-D22-D2”。混合物 - 1999 年基础与材料学会年度会议 oc.
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共 26 条
COMPACT AND HIGH DIELECTRIC STRENGTH OF ELECTRIC MACHINES WITH a-C:F FILM COATING OF LOW-DIELECTRIC CONSTANT AND HIGH DIELECTRIC STRENGTH DEPOSITED IN PLASMA
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批准号:17360121
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.47万
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财政年份:2005
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负责人:SAKAI Yosuke
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依托单位:
Alternative SF_6 insulation by deposition of amorphous CxFy film on electric machine conductors
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批准号:15360143
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.7万
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财政年份:2003
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负责人:SAKAI Yosuke
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依托单位:
Development of insulating system with low dielectric constant, high dielectric strength a-C:F film coated conductor prepared by plasma CVD as alternatives to SF_6
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批准号:13555077
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.77万
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财政年份:2001
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负责人:SAKAI Yosuke
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依托单位:
Study on Optimization of Barrier Discharge Excimer-Lamp
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批准号:07558175
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$1.15万
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财政年份:1995
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负责人:SAKAI Yosuke
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依托单位:
Fundamental Studies on LID Concentration and Discharge Decomposition of Nitrogen-Dioxide
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批准号:04452159
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.39万
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财政年份:1992
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负责人:SAKAI Yosuke
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依托单位:
Studies on Production of Supercooling State and Electrical Properties of Water Condenser for Energy Compression
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批准号:01550212
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.41万
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财政年份:1989
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负责人:SAKAI Yosuke
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依托单位:
海外基金