Laser Interference Lithography based 4D-printing of Nanomaterials

通过解决当前纳米材料4D打印的局限性，该项目寻求启动一种新的工艺范式，即基于激光干涉平版印刷（LIL）的4D打印，以快速准确地生产真正的3D结构和大容量4D纳米材料。它通过将激光干涉光刻的优势与先进的智能油墨相结合，实现了这一目标，产生了最先进的4D纳米材料制造能力。该方法对4D纳米材料的批量生产和市场应用具有一定的潜力。在我们的方法中，LIL图案被应用，图案被缝合形成真正的3D纳米结构，然后进行智能墨水的渗透。这种方法是基于一些既定的原则和财团内部获得的现有技术，但还有待进一步探索。该项目为3D图案和纳米计量学、4D纳米材料的生物活性-毒性和微观结构对电池性能/寿命的影响创造了新的知识。研究和创新的目标是整合体积激光干涉光刻扫描和深度曝光，以实现快速，准确，真正的3D结构制造，基于最先进的纳米计量学和表征，开发干涉图案单元和跨图案层之间的最佳对齐，以准确形成大体积3D纳米结构，并实现控制渗透，形成纳米材料的第四维。这项新技术将率先在生物医学和工程上应用。这些目标雄心勃勃，需要国际层面的合作。该项目通过在联盟成员和其他成员之间启动长期合作平台来解决合作问题。它还强调通过各种联合研究、创新和培训活动，特别是精心安排的借调来发展工作人员

By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks, producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of 4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to battery performance/life. The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments