Fundamental and applications of low temperature plasmas

我的研究计划的驱动动机与更好地理解低温等离子体所涉及的物理和化学现象的关键需求有关，因为需要在特定应用的背景下优化它们的参数，特别是在光子学和元素分析方面。在这种背景下，几年来，我一直在蒙特利尔大学领导一个研究项目，研究用于材料加工和分析的先进等离子体源的开发、表征和优化。该计划依赖于对等离子体科学的深刻理解，以及对等离子体诊断和建模的详尽知识，以及对等离子体应用的浓厚兴趣。这项研究在等离子体科学和材料处理和分析应用方面都取得了巨大的成功。我打算以我以前的成功工作为基础，继续在等离子体科学及其应用方面取得优异成绩。随着“等离子体科学与应用实验室”（LSAP）的实施，这项研究的影响将在加拿大得到极大的扩展，该实验室最近由CFI和魁北克省政府授予。在此背景下获得的新仪器将推动我的实验能力，以开发和实施基于激光的创新等离子体诊断，并继续研究用于先进材料蚀刻的先进等离子体源，以及材料和纳米材料的合成和分析。在此背景下，我在未来五年的具体目标将是：(i)追求和发展高密度等离子体蚀刻的研究和新光子器件制造的工艺优化，（ii）在材料和纳米材料合成和分析的背景下追求和发展激光等离子体的研究，以及（iii）模拟和优化微波诱导等离子体的特性用于分析应用。该项目产生的新知识和高素质人才的培训将产生强大的科学影响，并将刺激与加拿大高科技部门相关的应用程序的发展。

The driving motivation of my research program is related to the crucial needs for better understanding the physical and chemical phenomena involved in low temperature plasmas as required for optimizing their parameters in the context of specific applications, particularly in photonics and elemental analysis. In this context, for several years, I have been leading at the Université de Montreal a research program on the development, characterization and optimization of advanced plasma sources for applications to materials processing and analysis. This program relies on a deep understanding of plasma science and on an exhaustive know-how in plasma diagnostics and modeling, together with a strong interest for plasma applications. This research effort in both plasma science and materials processing and analysis applications has been extremely successful. I intend to build upon my previous successful work and continue to excel in plasma science and their applications. The impact of this research will be tremendously extended in Canada with the implementation of the "Laboratoire en Science et Applications des Plasmas" (LSAP) recently awarded by the CFI and Quebec government. The new instruments acquired in this context will allow to push my experimental capabilities to develop and implement innovative plasma diagnostics based on lasers, and pursue the investigation of advanced plasma sources for advanced materials etching, and materials and nanomaterials synthesis and analysis. In this context, my specific objectives for the next five years will be (i) pursue and develop the investigation of high-density plasma etching of advanced materials and process optimization for the fabrication of new photonic devices, (ii) pursue and develop the investigation of laser plasmas in the context of materials and nanomaterials synthesis and analysis and (iii) model and optimize the characteristics of microwave-induced plasmas for analytical applications. The new knowledge generated from this program and the training of highly qualified personnel will have a strong scientific impact and will stimulate the development of applications relevant for Canadian high-technology sectors.