Maintenance and improved operation of a high-density etching reactor intended for fundamental studies and applications to photonic materials

用于光子材料基础研究和应用的高密度蚀刻反应器的维护和改进操作

• 批准号: 345382-2007
• 负责人: Margot, Joëlle
• 金额: $ 5.62万
• 依托单位: Université de Montréal
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments - Category 1 (<$150,000)
• 财政年份: 2006
• 资助国家: 加拿大
• 起止时间: 2006-01-01 至 2007-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=326022
• 关键词: Maintenance; improved; operation; density; etching

The equipment requested is essential for pursuing my research program on high-density plasmas for nanometer patterning of advanced photonic materials. For addressing the present challenges facing this field, I have proposed a research program based on a truly scientific foundation. My goal is to investigate critical issues in plasma etching of photonic materials using my existing bench test high-density plasma reactor by putting the emphasis on materials of immediate interest for photonic applications, in particular VO2, LaSrMnO3 and LiNbO3. One of the crucial needs for pursuing this research is the availability of a confinement magnetic field that allows maintaining a sufficient plasma density while operating at the very low pressure appropriate for the etching of many materials. This field is generated by a set of electromagnetic coils powered by a DC high-current power supply that need to be urgently replaced to prevent failure. The other crucial need is a spectrometer able to provide sufficient spectral resolution in order to measure the gas temperature from the rotational structure of various molecular bands of either nitrogen, OH or CN. Such measurements are crucial to achieve a better understanding of the discharge dynamics in correlation with the etching characteristics. This equipment is critically important not only for the development of my own research, but also for the training of the students involved in plasma etching, namely 3 Ph.D and 1 M.Sc students, as well as those of my various collaborators.

所要求的设备是必不可少的追求我的研究计划，高密度等离子体的纳米图案的先进光子材料。为了应对这一领域目前面临的挑战，我提出了一个基于真正科学基础的研究计划。我的目标是调查的关键问题，在等离子体蚀刻的光子材料使用我现有的台架测试高密度等离子体反应器，把重点放在材料的直接利益的光子应用，特别是VO2，LaSrMnO3和LiNbO3。进行这项研究的关键需求之一是限制磁场的可用性，该磁场允许在适合于许多材料的蚀刻的非常低的压力下操作的同时保持足够的等离子体密度。这个磁场是由一组电磁线圈产生的，这些线圈由直流大电流电源供电，需要紧急更换以防止故障。另一个关键的需求是光谱仪能够提供足够的光谱分辨率，以便从氮，OH或CN的各种分子带的旋转结构测量气体温度。这样的测量是至关重要的，以实现更好地理解与蚀刻特性相关的放电动力学。该设备不仅对我自己的研究发展至关重要，而且对参与等离子体蚀刻的学生（即3名博士和1名理科硕士学生）以及我的各种合作者的培训也至关重要。