Pulsed high-density plasmas for challenging nanopatterning into advanced materials

脉冲高密度等离子体，用于挑战先进材料的纳米图案化

• 批准号: 458578-2014
• 负责人: Margot, Joëlle
• 金额: $ 8.82万
• 依托单位: Université de Montréal
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments - Category 1 (<$150,000)
• 财政年份: 2013
• 资助国家: 加拿大
• 起止时间: 2013-01-01 至 2014-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=541975
• 关键词: Pulsed; density; plasmas; challenging; nanopatterning

Pulsed plasmas have recently emerged as a solution to address some critical issues in plasma etching such as nanoscale patterning of several advanced materials. Indeed, pulsed plasmas present several advantages as compared to cw plasmas, which can considerably improve etching selectivity while maintaining profile anisotropy at the nanoscale with very little damage.

脉冲等离子体最近出现作为解决等离子体蚀刻中的一些关键问题的解决方案，例如几种先进材料的纳米级图案化。事实上，脉冲等离子体与连续波等离子体相比具有几个优点，其可以显著提高蚀刻选择性，同时在纳米级保持轮廓各向异性，且损伤非常小。