Excimer laser for plasma generation and applications

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The equipment requested is an excimer laser that will support many aspects of my research program, namely pulsed deposition, laser-induced plasma spectroscopy and diagnostics of high-density plasmas for nanometer patterning of advanced photonic materials. The driving motivation of my research program is related to the crucial needs for better understanding the physical and chemical phenomena involved in low temperature plasmas as required for optimizing their parameters in the context of specific applications. In this context, for several years, I have been leading at the Université de Montréal a research program on the development, characterization and optimization of advanced plasma sources for applications to materials processing and analysis. This program relies on a deep understanding of plasma science and on an exhaustive know-how in plasma diagnostics and modeling, together with a strong interest for plasma applications. I intend to build upon my previous successful work and continue to excel in plasma science and their applications. An important effort has been also recently devoted to integrate the various complementary aspects of the program to develop advanced materials processes for photonic devices. Among the aspects that I intend to pursue, let us note the following key issues : (i) develop and implement innovative plasma diagnostics based on lasers, (ii) pursue and develop the investigation of high-density plasma etching of advanced materials and process optimization for the fabrication of new photonic devices, and (iii) pursue and develop the investigation of laser plasmas in the context of materials and nanomaterials synthesis and analysis. The equipment will replace an excimer laser acquired in 1994 and that suffered from a major failure a few months ago, resulting in a severe research delay.