Fundamental and applications of low temperature plasmas

我的研究计划的驱动动机与更好地理解低温等离子体中所涉及的物理和化学现象的关键需求有关，这些现象是在特定应用背景下优化其参数所必需的，特别是在光子学和元素分析中。在这种情况下，几年来，我一直在蒙特利尔大学领导一项研究计划，研究先进等离子体源的开发，表征和优化，以应用于材料加工和分析。该计划依赖于对等离子体科学的深刻理解和对等离子体诊断和建模的详尽知识，以及对等离子体应用的浓厚兴趣。在等离子体科学和材料加工和分析应用方面的研究工作都非常成功。我打算建立在我以前的成功工作，并继续在等离子体科学及其应用中脱颖而出。随着CFI和魁北克政府最近授予的“等离子体科学与应用研究”（LSAP）的实施，这项研究的影响将在加拿大得到极大的扩展。在此背景下获得的新仪器将使我能够提高实验能力，开发和实施基于激光的创新等离子体诊断，并研究用于先进材料蚀刻以及材料和纳米材料合成和分析的先进等离子体源。在这种情况下，我未来五年的具体目标将是（i）追求和发展先进材料的高密度等离子体蚀刻和新光子器件制造工艺优化的研究，（ii）在材料和纳米材料合成和分析的背景下，继续和发展激光等离子体的研究，以及（iii）模拟和优化微波-诱导等离子体分析应用。该方案产生的新知识和高素质人员的培训将产生强大的科学影响，并将刺激与加拿大高技术部门有关的应用的发展。

The driving motivation of my research program is related to the crucial needs for better understanding the physical and chemical phenomena involved in low temperature plasmas as required for optimizing their parameters in the context of specific applications, particularly in photonics and elemental analysis. In this context, for several years, I have been leading at the Université de Montreal a research program on the development, characterization and optimization of advanced plasma sources for applications to materials processing and analysis. This program relies on a deep understanding of plasma science and on an exhaustive know-how in plasma diagnostics and modeling, together with a strong interest for plasma applications. This research effort in both plasma science and materials processing and analysis applications has been extremely successful. I intend to build upon my previous successful work and continue to excel in plasma science and their applications. The impact of this research will be tremendously extended in Canada with the implementation of the "Laboratoire en Science et Applications des Plasmas" (LSAP) recently awarded by the CFI and Quebec government. The new instruments acquired in this context will allow to push my experimental capabilities to develop and implement innovative plasma diagnostics based on lasers, and pursue the investigation of advanced plasma sources for advanced materials etching, and materials and nanomaterials synthesis and analysis. In this context, my specific objectives for the next five years will be (i) pursue and develop the investigation of high-density plasma etching of advanced materials and process optimization for the fabrication of new photonic devices, (ii) pursue and develop the investigation of laser plasmas in the context of materials and nanomaterials synthesis and analysis and (iii) model and optimize the characteristics of microwave-induced plasmas for analytical applications. The new knowledge generated from this program and the training of highly qualified personnel will have a strong scientific impact and will stimulate the development of applications relevant for Canadian high-technology sectors.