Optical process control for plasma-assisted deposition of functional nanoelectronic thin films

为了建立从研究级沉积工具到工业规模沉积功能纳米电子薄膜的技术转移，我们的目标是溅射沉积一种新型多铁材料Bi2FeCrO6，该材料迄今为止是通过脉冲激光沉积合成的。这种转移表明需要对薄膜生长进行额外的工艺控制。为了建立一种可能作为溅射器件补充工具箱出售的原位控制技术，我们将研究光学光谱技术的潜力，包括二次谐波产生和拉曼散射，以监测脉冲溅射方案中生长过程中材料的性能。这两个行业合作伙伴分别专注于溅射工具和光学检测同步。研究团队由薄膜生长、铁电学和光谱学方面的专家组成，他们在这个为期三年的项目中结合了所有必要的专业知识。大力培养和培训高素质的人员是及时达到所有里程碑的关键，因此我们几乎把所有预算都用于薪金和培训。概念验证和原位表征的首次演示不仅将使我们的工业合作伙伴立即受益，而且还将更好地理解电子工业中薄膜的使能技术，其影响范围将超出团队合作伙伴。

With the goal to establish a technology transfer from research grade deposition tools to industrial scale for the deposition of functional nanoelectronic thin films, we target sputter deposition for a novel multiferroic material, Bi2FeCrO6, which has so far been synthesized by pulsed laser deposition. This transfer has shown to require additional process control regarding the film growth. In order to establish an in-situ control technique that can possibly sell as a complementary toolbox for sputtering devices, we will investigate the potential of optical spectroscopy techniques including second harmonic generation and Raman scattering to monitor the properties of the material during growth in a pulsed sputtering scheme. The two industrial partners are specialized in sputter tools and in the synchronization of optical detection respectively. The research team is composed of specialists in thin film growth, ferroelectrics and optical spectroscopy, which combines all necessary expertise in this three-year project. The intense implication and training of highly qualified personnel is the key to meeting all milestones in due time, we therefore dedicate almost all budget to salaries and training. The proof of concept and a first demonstration of in-situ characterization will not only have our industrial partners benefit immediately but will also create a better understanding of an enabling technology for thin films in electronic industries with a broader impact that reaches beyond the team partners.