A Double Crystal X-Ray Diffractometer System

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This grant is for partial purchase support of an X-Ray Diffractometer System to aid the III-V semiconductor materials research effort at the University of Michigan. The Solid State Electronics Laboratory is presently equipped with a Riber 2300 Molecular Beam Epitaxy (MBE) System used for the growth of III-V semiconductor materials. The epitaxial materials are characterized by photoluminescence, Hall Effect Measurements, and Deep Level Transient Spectroscopy. Currently much research is aimed at the growth and characterization of strained layers formed from heterojunctins composed of materials of different lattice constants. An X-ray Diffractometer System is an invaluable tool in measuring lattice constants and characterizing strains present in mismatched systems.