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Nonstationary Transport in Semiconductor Device Modeling

Nonstationary Transport in Semiconductor Device Modeling
半导体器件建模中的非平稳传输
批准号:
8714472
负责人:
Dee-Son Pan
金额:
$0.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1987
资助国家:
美国
项目状态:
已结题
起止时间:
1987-06-15 至 1988-05-31

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中文摘要
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英文摘要
For 1 um Si MOSFETs, the spatial transient effect can make up to 20% modification of the local mobility. This effect is certainly larger in submicron devices. In this computational project, we will investigate this effect by both analytical techniques as well as Monte Carlo simulations on the San Diego Cray XMP. The goal is to understand the transport physics at small distances involved in submicron devices and to obtain a mobility formula, simple and accurate, to use in device simulators. The major computational technique will be Monte Carlo procedures. This is an expedited award for novel research, for which no funds have been granted. The PI has been granted 50 service units at the NSF Supercomputer Center at San Diego.
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  • 项目类别:
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  • 资助金额:
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  • 项目类别:
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  • 资助金额:
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  • 批准年份:
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  • 负责人:
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