High Concentration Ozone Production for Semiconductor Manufacturing

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The objective of the research is to explore the feasibility of developing compact, high concentration, ozone generation equipment for the demanding requirements of the semiconductor manufacturing and materials processing industry. Emerging processing technologies using ozone chemistry have given rise to the need for such equipment. Current generators are inadequate for the task and too large to be installed in the clean room environment next to the chemical vapor deposition system or other semiconductor tool. Current double-cooled generator designs also require a dielectric coolant and a dedicated recirculating oil cooling system to remove heat from the generator electrodes. The experimental program will be directed toward establishing the feasibility of developing a compact generator module and excitation source with the required performance.