Chemical Vapor Deposition Equipment for Thin Film Integrated Sensor Fabrication

用于薄膜集成传感器制造的化学气相沉积设备

• 批准号: 9413559
• 负责人: Kensall Wise
• 金额: $ 11.1万
• 依托单位: Regents of the University of Michigan - Ann Arbor
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-09-15 至 1997-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9413559&HistoricalAwards=false
• 关键词: Chemical; Vapor; Deposition; Equipment; Thin

9413559 Wise This proposal requests funding to significantly upgrade the equipment for producing chemical-vapor deposited (CVD) thin dielectric films at the University of Michigan. Specifically, the proposal seeks funding to upgrade the pumping system on our existing LPCVD system for silicon nitride and silicon dioxide in order to overcome serious problems with down-time that have been experienced over the last several years. These problems have seriously impeded a number of important research programs. In addition, the proposal seeks funding to install a new CVD system for the deposition of low-temperature oxide (LTO) and phosphosilicate glass (PSG). While these processes are basic and standard throughout the microelectronics industry, they have never been available at Michigan, seriously limiting our research capabilities and the types of structures that can be addressed. The lack of these films has been a major factor limiting our research on surface micromachined microstructures, which are useful in the development of a great many integrated sensors and microactuators. Specific immediate uses of the LTO/PSG system include the conformal chip-level encapsulation of integrated sensors for use in chronically-implantable neural prostheses, the development of planarized feedthroughs for hermetically-sealed microsystems, and application in a number of microsensors and microactuators for use in transportation systems and automated semiconductor manufacturing. The proposed equipment directly affects the programs of 26 faculty and nearly 50 graduate research students at the University of Michigan; in addition, it will permit an expanded range of projects in two laboratory courses at the University and will allow structures such as those produced by surface micromachining to be introduced into the courses in a practical way. The field of sensors, microactuators, and microsystems ("MEMS") us expanding on a worldwide basis and is generally accepted as very important to areas such as health ca re, environmental CLOSEOUTDOC I T FTMON94 DOC $9 L MAY24PANDOC q ? X REIMFORTDOC WJ JIN TX8 Y f CONRAD TX8 p` i WISE TX8 +c

9413559 Wise该提案要求提供资金，以大幅升级密歇根大学生产化学气相沉积（CVD）薄介电薄膜的设备。 具体而言，该建议寻求拨款，以提升我们现有的氮化硅和二氧化硅LPCVD系统的泵送系统，以克服过去几年经历的停机时间的严重问题。 这些问题严重阻碍了一些重要的研究计划。 此外，该提案还寻求资金来安装一个新的CVD系统，用于沉积低温氧化物（LTO）和磷硅酸盐玻璃（PSG）。 虽然这些工艺是整个微电子行业的基本和标准，但密歇根州从未提供过这些工艺，这严重限制了我们的研究能力和可以解决的结构类型。 这些薄膜的缺乏一直是限制我们研究表面微机械结构的主要因素，这些微机械结构在许多集成传感器和微致动器的开发中是有用的。 LTO/PSG系统的具体直接用途包括用于长期植入式神经假体的集成传感器的共形芯片级封装，用于密封微系统的平面化馈电线的开发，以及用于运输系统和自动化半导体制造的许多微传感器和微致动器的应用。 拟议中的设备直接影响到密歇根大学26名教师和近50名研究生的计划;此外，它将允许在大学的两个实验室课程中扩大项目范围，并将允许诸如表面微加工产生的结构以实用的方式引入课程。 传感器、微致动器和微系统（“MEMS”）的领域正在全球范围内扩展，并且被普遍认为对诸如健康护理、环境保护、生物安全和生物安全等领域非常重要。 I T FTMON 94文档 $9升 MAY24PANDOC q？X REIMFORTDOC WJ 金 TX8 Y f 康拉德TX 8 比伊 明智 TX8 +C