Chemical Vapor Deposition Equipment for Thin Film Integrated Sensor Fabrication
Chemical Vapor Deposition Equipment for Thin Film Integrated Sensor Fabrication
批准号:
9413559
负责人:
Kensall Wise
金额:
$11.1万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-09-15 至 1997-08-31
中文摘要
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英文摘要
9413559 Wise This proposal requests funding to significantly upgrade the equipment for producing chemical-vapor deposited (CVD) thin dielectric films at the University of Michigan. Specifically, the proposal seeks funding to upgrade the pumping system on our existing LPCVD system for silicon nitride and silicon dioxide in order to overcome serious problems with down-time that have been experienced over the last several years. These problems have seriously impeded a number of important research programs. In addition, the proposal seeks funding to install a new CVD system for the deposition of low-temperature oxide (LTO) and phosphosilicate glass (PSG). While these processes are basic and standard throughout the microelectronics industry, they have never been available at Michigan, seriously limiting our research capabilities and the types of structures that can be addressed. The lack of these films has been a major factor limiting our research on surface micromachined microstructures, which are useful in the development of a great many integrated sensors and microactuators. Specific immediate uses of the LTO/PSG system include the conformal chip-level encapsulation of integrated sensors for use in chronically-implantable neural prostheses, the development of planarized feedthroughs for hermetically-sealed microsystems, and application in a number of microsensors and microactuators for use in transportation systems and automated semiconductor manufacturing. The proposed equipment directly affects the programs of 26 faculty and nearly 50 graduate research students at the University of Michigan; in addition, it will permit an expanded range of projects in two laboratory courses at the University and will allow structures such as those produced by surface micromachining to be introduced into the courses in a practical way. The field of sensors, microactuators, and microsystems ("MEMS") us expanding on a worldwide basis and is generally accepted as very important to areas such as health ca re, environmental CLOSEOUTDOC I T FTMON94 DOC $9 L MAY24PANDOC q ? X REIMFORTDOC WJ JIN TX8 Y f CONRAD TX8 p` i WISE TX8 +c
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批准号:1244990
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:2012
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负责人:Kensall Wise
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依托单位:
Workshop On: Micro/Nanoelectronics: Devices and Technologies for Biomedical Applications. The Workshop will be held at IMEC in Leuven, Belgium from September 25-26, 2008.
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批准号:0843482
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项目类别:Standard Grant
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资助金额:$4.91万
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财政年份:2008
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负责人:Kensall Wise
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依托单位:
NSF ERC Administrative Directors Summer Meeting 2004
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批准号:0431381
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项目类别:Standard Grant
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资助金额:$2.2万
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财政年份:2004
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负责人:Kensall Wise
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依托单位:
An Engineering Research Center In Wireless Integrated Microsystems
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批准号:9986866
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项目类别:Cooperative Agreement
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资助金额:$0.0万
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财政年份:2000
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负责人:Kensall Wise
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依托单位:
1997 International Conference on Solid-State Sensors and Actuators to be held in Chicago on June 16-19, 1997
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批准号:9713494
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项目类别:Standard Grant
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资助金额:$2.27万
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财政年份:1997
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负责人:Kensall Wise
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依托单位:
A High-Performance Vacuum Evaporation System
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批准号:8305962
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项目类别:Standard Grant
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资助金额:$3.18万
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财政年份:1983
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负责人:Kensall Wise
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依托单位:
Processing Techniques For Silicon Microstructures
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批准号:7916459
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项目类别:Standard Grant
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资助金额:$11.0万
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财政年份:1980
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负责人:Kensall Wise
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依托单位:
Ion Beam Etching System For Support of Microelectronics Research
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批准号:7811474
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项目类别:Standard Grant
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资助金额:$2.12万
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财政年份:1978
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负责人:Kensall Wise
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依托单位:
Instability Mechanisms in Batch Fabricated Solid-State Pressure Sensors
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批准号:7608297
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项目类别:Standard Grant
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资助金额:$7.02万
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财政年份:1976
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负责人:Kensall Wise
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依托单位:
海外基金