Renovation of Advanced Thin Film Smart Materials Processing Research Laboratory
先进薄膜智能材料加工研究实验室改造
基本信息
- 批准号:9415038
- 负责人:
- 金额:$ 23.2万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:1995
- 资助国家:美国
- 起止时间:1995-06-01 至 1996-12-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
NSF funds will support the development of a clean room as part of the Advanced Thin Film Materials Laboratory for the Materials and Nuclear Engineering program at the University of Maryland, College Park. The renovated facility will be located in the 30-year old J.M. Patterson building and will be a critical resource for film deposition and sample preparation of -smart+ materials. The facility will enable breakthroughs for advanced interconnects for the next generation of ferroelectric devices and micro-electromechanical (MEMS) structures. Materials processing requires a dust-free environment with filtered recirculated de-ionized water and vibration-free flooring. The existing space lacks these necessities and is incompatible with the capital equipment already owned and utilized by the department for this work. The renovation of space to house the equipment and the research activity promises to remove a major impediment to scientific breakthroughs. The current space has exposed ceiling pipes for water and does not include access to de-ionized water. Power to the equipment is provided through dangerous hanging cords, and the rooms are without an air recirculation filtration system. The windows, walls and doors are not adequately sealed against particulate matter. The existing hoods are insufficient in number and do not function within acceptable standards of safety. The renovation effort will provide a class 1,000 clean room environment with laminate finish chipboard wall panels and doors, suspended ceilings and a new vinyl floor finish. Vertical wardrobe-type air conditioning units will be placed adjacent to the facility to assure internal temperature and humidity stability, and absolute H.E.P.A. filters will be mounted in the ceiling to assure almost 100% efficiency in particulate removal in air recirculation. The new facility will provide new opportunities in materials processing for graduate student training. Research activities will include thin film martensite, ferroelectric oxides, and rapid thermal processing of thin films. Thin film martensite investigations emphasize elastic and anelastic properties of thin film composites and will lead to the development of unique micro-mechanical devices. The activities in ferroelectric oxides will feed directly from ferroelectric films optical memories and optical signal processors. Rapid thermal processing will allow the researcher to tailor surface and interface material properties. Seven faculty and their graduate researchers will be the direct beneficiaries of the new laboratory facility.
美国国家科学基金会的资金将支持开发一个无尘室,作为马里兰大学帕克分校材料与核工程项目高级薄膜材料实验室的一部分。翻新后的设施将位于拥有30年历史的J.M. Patterson大楼内,将成为薄膜沉积和-smart+材料样品制备的关键资源。该设施将使下一代铁电器件和微机电(MEMS)结构的先进互连取得突破。物料处理需要无尘环境,使用过滤过的再循环去离子水和无振动地板。现有的空间缺乏这些必需品,并且与该部门已经拥有和使用的资本设备不兼容。设备和研究活动空间的翻新有望消除科学突破的一个主要障碍。目前的空间有暴露的天花板供水管道,不包括去离子水。设备的电源是通过危险的悬挂电线提供的,房间没有空气再循环过滤系统。窗户、墙壁和门没有足够的密封以防止颗粒物。现有的通风柜数量不足,不能在可接受的安全标准内发挥作用。翻新工作将提供1000级洁净室环境,采用层压板饰面刨花板墙板和门,悬挂天花板和新的乙烯基地板饰面。垂直衣柜式空调机组将放置在设施附近,以确保内部温度和湿度的稳定性,并且绝对的heepa过滤器将安装在天花板上,以确保空气再循环中几乎100%的微粒去除效率。新工厂将为研究生的材料加工培训提供新的机会。研究活动将包括薄膜马氏体、铁电氧化物和薄膜的快速热加工。薄膜马氏体研究强调薄膜复合材料的弹性和非弹性性能,并将导致独特的微机械器件的发展。铁电氧化物的活性将直接从铁电薄膜、光存储器和光信号处理器中获得。快速热加工将使研究人员能够定制表面和界面材料特性。七名教师和他们的研究生研究人员将成为新实验室设施的直接受益者。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Aristos Christou其他文献
Caractéristiques électriques de transistors à mobilité électronique élevée utilisant des superréseaux AlAs-GaAs de type N et fabriqués á I’aide de procédés laser
- DOI:
10.1007/bf02995134 - 发表时间:
1990-05-01 - 期刊:
- 影响因子:2.200
- 作者:
Abdenabi Belhadj;Jean-Michel Dumas;Aristos Christou;Georges Kiriakidis;Pierre Audren;Jonathan Goostray;Hugh Thomas - 通讯作者:
Hugh Thomas
Focused waves on shear currents interacting with a vertical cylinder
剪切流上的聚焦波与垂直圆柱相互作用
- DOI:
10.1016/j.coastaleng.2025.104698 - 发表时间:
2025-05-15 - 期刊:
- 影响因子:4.500
- 作者:
Aristos Christou;Dimitris Stagonas;Eugeny Buldakov;Thorsten Stoesser - 通讯作者:
Thorsten Stoesser
Aristos Christou的其他文献
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{{ truncateString('Aristos Christou', 18)}}的其他基金
EAGER: Diamond Delta Doped p FET
EAGER:金刚石 Delta 掺杂 p FET
- 批准号:
1747847 - 财政年份:2017
- 资助金额:
$ 23.2万 - 项目类别:
Standard Grant
Workshop on Defects in Wide Bandgap (WBG) Semiconductors. Held University of Maryland, College Park Maryland, September, 22, 2014.
宽带隙 (WBG) 半导体缺陷研讨会。
- 批准号:
1445005 - 财政年份:2014
- 资助金额:
$ 23.2万 - 项目类别:
Standard Grant
Federation of Materials Societies 2004 Biennial Conference, "Materials Education for the 21st Century Workforce"; Washington, DC; May 23-24, 2004
材料学会联合会2004年双年会,“21世纪劳动力的材料教育”;
- 批准号:
0407473 - 财政年份:2004
- 资助金额:
$ 23.2万 - 项目类别:
Standard Grant
Optoelectronic Devices, Interconnects, and Packaging (COEDIP Center)
光电器件、互连和封装(COEDIP 中心)
- 批准号:
0086554 - 财政年份:2000
- 资助金额:
$ 23.2万 - 项目类别:
Continuing Grant
The Organization of An Invited Workshop to Assess the State-of-the-art Nanotribology and to Identify Critical Research Issues
组织特邀研讨会以评估最先进的纳米摩擦学并确定关键研究问题
- 批准号:
0001381 - 财政年份:2000
- 资助金额:
$ 23.2万 - 项目类别:
Standard Grant
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