Low Temperature Deposition of Thin Metal Films for Solar Cell Applications

9423716 He薄膜在电子器件和电路中的应用是当前非常感兴趣的课题，将被研究。本研究的目的是通过低温沉积获得一种可靠的、低阻的、薄的金属薄膜，以获得较低的电阻性能。计划工作如下：(1)制备包括Au、Al、Ag、Pd、Ni和Cr在内的各种常规接触金属的均匀、电性和结构稳定的LT薄膜；(2)评估电阻率、TCR及其与薄膜厚度的关系，以及薄膜制备条件、沉积速度和衬底温度。进行稳定性测试；以及(3)确定LT薄膜的物理和化学结构以及导电机制，将微结构特性与电学数据关联起来。该项目还将对LT薄膜的电学和结构特性有一个更好的基本了解。***

9423716 He Thin metal film applications in electronic devices and circuits are topics of great current interest and will be studied. The goal of this research is to obtain a reliable, low-resistivity, thin metal film by LT deposition, to attain lower resistance performance. The planning activities are as follows: (1) Prepare uniform, electrical and structural stable LT thin films of various conventional contact metals including : Au, Al, Ag, Pd, Ni and Cr; (2) Evaluate the resistivity, TCR and their relation to the film thickness as well as the film preparation conditions, deposition rate and substrate temperature. Perform the stability test; and (3) Identify the physical and chemical structure, as well as the conduction mechanism of the LT thin films, correlating microstructural properties with electrical data. This project will also provide a better basic understanding of the electrical and structural characteristics of the LT thin films. ***