The Fifth International Conference on Chemical Beam Epitaxy to be held at the University of California, San Diego on August 14-16, 1995

化学束外延国际会议正在召开，讨论当前材料生长和表征的主题，包括几个日益重要的当代外延主题，即：外延，化学前体；薄膜和界面的表征。还有一些会议涉及物理和设备方面，强调基本过程。此外，还将有机会评估该领域，并在大学、研究机构和工业界之间建立联系。预计该领域的顶尖科学家将出席会议，会议将提供一个有效的论坛来讨论和描述该研究领域的关键科学问题，并考虑和确定解决这些问题所需的方法和技术。评价化学束外延及其相关加工的进展和现状，特别是外延、加工中的关键材料研究问题，以及材料研究与器件和电路制造的关系，以及当前对该领域最重要的当代研究问题的评估，将对电子和光子学领域中先进材料的理解和提高利用具有重要价值。＊＊＊

9508599 Tu An International Conference on Chemical Beam Epitaxy is being held to address current topics in materials growth and characterization including several contemporary topics on epitaxy of increasing importance, namely: Epitaxy, Chemical Precursors; Characterization of films and interfaces. There are also a number of sessions dealing with physics and device aspects with a strong emphasis on fundamental processes. Additionally there will be an opportunity to assess the field, and to establish ties between universities, research institutions, and industry. It is expected that top scientists in the field will attend, and that the Conference will provide an effective forum to discuss and delineate the critical scientific issues in this research area, and to consider and define the approaches and techniques needed to address them. %%% An evaluation of the progress and status of Chemical Beam Epitaxy and related processing, and especially critical materials research issues in epitaxy, processing, and the relationship of materials research to device and circuit fabrication along with current assessments of the most important contemporary research issues in this field will be of great value to the understanding and enhanced utilization of advanced materials in the field of electronics and photonics. ***