Novel Approaches for Deposition, Characterization and DeviceStudies of Carbon Nitride

Gangopadhyay教授的提案涉及氮化碳沉积，表征和器件研究的新方法。实验工作的重点是开发两种沉积系统，即远程等离子体增强化学蒸汽系统（RPECVD）和电容放电室（CDC），用于“超硬”氮化碳的生长。根据工艺中使用的参数、衬底温度和偏置电压的不同，通过这些方法生长的碳膜预计是无定形的或结晶的。这些薄膜的一个应用是在现场可编程门阵列（FPGA）的防引信领域。由于等离子体的稳定性，以前对这种材料的研究都不成功；然而，获得远程等离子体系统应该使PI能够实现对腔室中碳氢和氮氢产物的控制。＊＊＊

9522129 Gangopadhyay The proposal by Prof. Gangopadhyay involves novel approaches for the deposition, characterization and device studies in Carbon Nitride. The experimental work focuses on the development of two deposition systems, namely, a remote plasma enhanced chemical vapor system (RPECVD) and a capacitive discharge chamber (CDC) for the growth of 'superhard' carbon nitride. The carbon films grown by these methods is expected to be amorphous or crystalline depending upon the parameters, substrate temperature and bias voltages employed in the process. An application of these films is in the area of antifuzes for field programmable gate arrays (FPGA's). Previous studies of this material were unsuccessful due to the stability of the plasma; however, the acquisition of a remote plasma system should enable the PI to achieve control over the C-H and N-H products in the chamber. ***