NSF-CGP Fellowship: An In situ Scanning Tunneling Micro- scopy Study of Group III Nitride Thin Films

小行星9602468 该奖项支持美国-日本合作研究博士伊格内修斯S。T.亚利桑那州立大学物理系的Tsong和日本仙台东北大学材料研究所的Toshio Sakurai博士。 Tsong博士将在东北大学进行为期12个月的分子束外延（MBE）生长氮化物薄膜的原位扫描隧道显微镜（STM）研究。 研究人员将尝试确定最佳生长温度和最适合高质量MBE薄膜生长的氮通量物种。 访问期间获得的结果将与亚利桑那州立大学研究人员实验室中使用种子超声束进行的氮化物生长的低能电子显微镜（LEEM）研究相关联。 这位美国研究人员将他在金属、合金和半导体表面的几何和缺陷结构、原子组成和吸附物动力学方面的知识带到了这次合作中。 这是补充了类似的知识，日本研究人员谁拥有特定的专业知识，在该领域的STM。 他的实验室配备了最先进的仪器，他的MBE-STM系统是世界上为数不多的此类仪器之一。 该项目预计将提供具有关键价值的新信息，以获得与外延生长相关的基本材料科学现象的新的和更深入的理解，以及一类材料中的其他相关加工现象，电子/光子，具有高技术和经济意义。 预计这些实验室之间的合作将促进未来的合作。 ***

9602468 Tsong This award supports U.S.-Japan collaborative research between Dr. Ignatius S. T. Tsong of the Department of Physics at Arizona State University and Dr. Toshio Sakurai of the Institute of Materials Research at Tohoku University in Sendai, Japan. Dr. Tsong will be spending twelve months at Tohoku University to conduct an in situ scanning tunneling microscopy (STM) study of nitride thin films grown by molecular beam epitaxy (MBE). The researchers will attempt to identify the optimum growth temperature and the most suitable nitrogen flux species for high quality MBE film growth. The results obtained during the visit will be correlated with the low-energy electron microscopy (LEEM) study of nitride growth with seeded supersonic beams in the researcher's laboratory at Arizona State University. The U.S. researcher brings to this collaboration his knowledge of geometric and defect structures, atomic composition, and adsorbate kinetics on the surfaces of metals, alloys and semiconductors. This is complemented by similar knowledge of the Japanese researcher who has specific expertise in the area of STM. His laboratory is equipped with state-of-the-art instrumentation and his MBE- STM system is one of only a handful of such instruments in the world. The project is expected to provide new information of critical value to gaining new and deeper understanding of fundamental materials science phenomena associated with the epitaxial growth as well as other related processing phenomena in a class of materials, electronic/photonic, having high technological and economic significance. It is expected that the cooperation between these laboratories should foster future collaborations. ***