Inversion-Based High-Speed/High-Precision Tracking for Scanning-Probe-Based Nanofabrication
Inversion-Based High-Speed/High-Precision Tracking for Scanning-Probe-Based Nanofabrication
批准号:
9612300
负责人:
Santosh Devasia
金额:
$16.86万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-09-01 至 1999-09-30
中文摘要
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英文摘要
9612300 Devasia The scanning tunneling microscope (STM) is one of the important nanofabrication tools used for precision lithography of structures below 100 nm. As a manufacturing tool, high precision is achieved at the expense of throughput using low scanning speeds. This project will improve throughput by developing the theoretical and experimental expertise needed for high-speed/high-precision scanning probes for STM. The technical approach uses nonlinear inversion of the piezo actuator dynamics for scan path tracking, and feedback to handle the modeling errors. The four theoretical and experimental parts of the research are: (1) piezo modeling and order reduction, (2) inversion-based control design, (3) high speed scan path design using the inversion based control to minimize vibration, and (4) feedback control to stabilize the scan path and reduce errors attributed to unmodeled dynamics. Success of this project will increase the productivity of current microelectronics fabrication equipment, and will enable the design of the next generation of machines needed for positioning below 10 nm. This will allow the fabrication of higher performance microelectronic devices at lower cost.
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