Controllability of a Fluid-Structure Interaction Arising in Chemical Vapor Deposition

化学气相沉积中产生的流固相互作用的可控性

• 批准号: 9710981
• 负责人: George Avalos
• 金额: $ 1.8万
• 依托单位: Texas Tech University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-07-15 至 1998-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9710981&HistoricalAwards=false
• 关键词: Controllability; Fluid; Structure; Interaction; Arising

Controllability of a Fluid-Structure Interaction Arising in Chemical Vapor Deposition In this project, we spell out an infinite dimensional control problem arising from the use of chemical vapor deposition (CVD) in the manufacture of this films on the surface of a substrate; this CVD is used in a host of technological applications, including the construction of microelectric circuitry, compound semiconductor devices and high-performance cutting and grinding tools. Mathematically, one has a version of the Navier-Stokes equations coupled to a semilinear heat equation, with the control (temperature) implemented on a wall of the boundary. With a view towards determining the physical feasibility of improving the quality of the film growth by controlling the wall temperature, we aim to study the controllability of the associated system of coupled partial differential equations, controllability in a sense to be made precise below. The approach to be taken in addressing our control theoretic question will be that adopted for other coupled partial differential equations seen in the analysis of "smart material" technology. Both continuous and approximation theory will be considered in this work.

在该项目中化学蒸气沉积中产生的流体结构相互作用的可控性，我们阐明了在化学蒸气沉积（CVD）在底物表面制造该膜中使用化学蒸气沉积（CVD）引起的无限尺寸控制问题； 该CVD用于许多技术应用中，包括微电路的构建，复合半导体设备以及高性能切割和磨削工具。 从数学上讲，一个版本的Navier-Stokes方程与半线性热方程式结合，并且在边界壁上实现了控制（温度）。 为了确定通过控制壁温改善膜增长质量的物理可行性，我们旨在研究相关的耦合部分微分方程的相关系统的可控性，从而在下面精确地进行可控性。 解决我们的控制理论问题时要采取的方法将是针对“智能材料”技术分析中的其他耦合部分微分方程的方法。 在这项工作中将考虑连续和近似理论。