A Near-Field Scanning, Phase-Contrast Microscope

这笔赠款为开发近场扫描光学显微镜(NSOM)提供资金，该显微镜利用独特的相衬机制。商用的标准NSOM使可见光显微镜的范围扩展到通常为电子显微镜保留的空间分辨率纳米范围。然而，与电子显微镜不同的是，NSOM可以在其自然环境(即液体和环境压力)中对样品成像，并可以在获得强度图像的同时获得扫描力表面轮廓。NSOM利用与传统远场方法相同的对比度机制(即荧光、透射率、偏振、光谱、反射率和相位)。本文提出的仪器将结合标准的NSOM操作和纯相位成像，提供一种新型的可量化的NSOM相衬测量仪器，可用于广泛的微细观尺度设备的测量。在许多学科中，分子或近分子尺度物体的测量变得越来越重要。这些物体的范围从工程表面，如光盘、磁盘、集成电路和钻石加工的光学元件，到铂、DNA分子、细胞生物学和晶体中的纳米级缺陷的催化阵列。远场位相显微镜目前是所有这些领域的主要分析方法。该项目的成功将把位相显微镜扩展到纳米领域。这项工作中要研究的特殊系统包括生物细胞、光刻胶掩膜和光纤。半导体行业的路线图要求70 nm的线宽，这是目前的光学方法无法定量测量的。此外，随着光纤行业的快速发展，50 nm分辨率光纤折射率分布的测定将有助于制造商进行光纤设计和质量控制流程。结合对更高空间分辨率分析工具的需求，这一特定项目的成功将对许多学科具有价值。

This grant provides funding for the development of a near-field scanning optical microscope (NSOM) which utilizes a unique phase-contrast mechanism. The standard NSOM, available commercially, has allowed the range of visible light microscopy to be extended into the nanometer range of spatial resolution normally reserved for electron microscopes. However, unlike the electron microscope, an NSOM can image specimens in their natural environment (i.e., liquids and ambient pressures) and can obtain scanning force surface profiles simultaneous with intensity images. An NSOM takes advantage of the same contrast mechanisms available to conventional far-field methods (i.e., fluorescence, transmission, polarization, spectroscopy, reflectivity, and phase). The instrument proposed here would combine standard NSOM operation with pure phase imaging to provide a novel quantifiable NSOM phase-contrast measuring instrument useful for the metrology of a broad range of micro and meso scale devices.Measurement of objects at a molecular or near molecular scale is becoming increasingly important in many disciplines. These objects range from engineering surfaces, such as optical discs, magnetic disks, integrated circuits, and diamond turned optics to catalytic arrays of platinum, DNA molecules, cell biology, and nanoscale flaws in crystals. Far-field phase microscopy is currently a workhorse method of analysis in all of these areas. Success of this project will extend phase microscopy into the nanometer region. Particular systems to be studied in this work include biological cells, photoresist masks, and optical fibers. The semiconductor industry roadmap calls for 70-nm linewidths, which cannot be quantifiably measured with current optical methods. In addition, with the rapid growth of the optical fiber industry, determination of index of refraction profiles of optical fibers with 50-nm resolution will help manufacturers with fiber design and quality control processes. Combined with the need for higher spatial resolution analytical tools, success of this particular project will be of value to many disciplines.