A Near-Field Scanning, Phase-Contrast Microscope

这笔赠款提供资金的近场扫描光学显微镜（NSOM），利用独特的相位对比机制的发展。标准的NSOM，可商购获得，允许可见光显微镜的范围被扩展到通常为电子显微镜保留的空间分辨率的纳米范围。 然而，与电子显微镜不同，NSOM可以在其自然环境中对标本进行成像（即，液体和环境压力），并且可以获得与强度图像同时的扫描力表面轮廓。 NSOM利用与传统远场方法相同的对比度机制（即，荧光、透射、偏振、光谱学、反射率和相位）。 本文提出的仪器将联合收割机标准NSOM操作与纯相位成像相结合，提供一种新型的可定量的NSOM相衬测量仪器，可用于测量范围广泛的微尺度和中尺度器件。 这些对象的范围从工程表面，如光盘，磁盘，集成电路和金刚石转向光学铂，DNA分子，细胞生物学和晶体中的纳米级缺陷的催化阵列。 远场相位显微镜是目前所有这些领域的主力分析方法。这一项目的成功将把相位显微术扩展到纳米区域。在这项工作中要研究的特定系统包括生物细胞，光刻胶掩模和光纤。 半导体行业路线图要求70 nm线宽，这无法用当前的光学方法进行量化测量。 此外，随着光纤行业的快速发展，以50 nm分辨率测定光纤的折射率分布将有助于制造商进行光纤设计和质量控制过程。 结合对更高空间分辨率分析工具的需求，这一特定项目的成功将对许多学科具有价值。

This grant provides funding for the development of a near-field scanning optical microscope (NSOM) which utilizes a unique phase-contrast mechanism. The standard NSOM, available commercially, has allowed the range of visible light microscopy to be extended into the nanometer range of spatial resolution normally reserved for electron microscopes. However, unlike the electron microscope, an NSOM can image specimens in their natural environment (i.e., liquids and ambient pressures) and can obtain scanning force surface profiles simultaneous with intensity images. An NSOM takes advantage of the same contrast mechanisms available to conventional far-field methods (i.e., fluorescence, transmission, polarization, spectroscopy, reflectivity, and phase). The instrument proposed here would combine standard NSOM operation with pure phase imaging to provide a novel quantifiable NSOM phase-contrast measuring instrument useful for the metrology of a broad range of micro and meso scale devices.Measurement of objects at a molecular or near molecular scale is becoming increasingly important in many disciplines. These objects range from engineering surfaces, such as optical discs, magnetic disks, integrated circuits, and diamond turned optics to catalytic arrays of platinum, DNA molecules, cell biology, and nanoscale flaws in crystals. Far-field phase microscopy is currently a workhorse method of analysis in all of these areas. Success of this project will extend phase microscopy into the nanometer region. Particular systems to be studied in this work include biological cells, photoresist masks, and optical fibers. The semiconductor industry roadmap calls for 70-nm linewidths, which cannot be quantifiably measured with current optical methods. In addition, with the rapid growth of the optical fiber industry, determination of index of refraction profiles of optical fibers with 50-nm resolution will help manufacturers with fiber design and quality control processes. Combined with the need for higher spatial resolution analytical tools, success of this particular project will be of value to many disciplines.