Stress Effects on Kinetic Processes

应力对动力学过程的影响

• 批准号: 0213373
• 负责人: Michael Aziz
• 金额: $ 36.49万
• 依托单位: Harvard University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-08-15 至 2005-10-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0213373&HistoricalAwards=false
• 关键词: Stress; Effects; Kinetic; Processes

This project involves a combined experimental and theoretical study of the effects of nonhy-drostatic stress on the kinetic processes of epitaxial crystal growth and diffusion. The impact of stress-dependent activation barrier heights for crystal growth and surface diffusion on growth morphology evolution will be studied. The effect of simple, uniform stress states on atomic dif-fusion in thin films, both parallel and perpendicular to the surface, will be measured. The theory of diffusion under nonhydrostatic stress states will be further developed. This research is ex-pected to establish methods by which the measurement of the stress-dependence of a kinetic pro-cess under a few simple, uniform stress states permits the prediction of the effect of an arbitrary, nonuniform stress state-deemed important for the design of future semiconductor devices. It also permits the determination of processes going on in the interior of solids, where they cannot be observed directly, from the results of atomistic theoretical calculations and experimental ob-servations of the response to imposed external stresses. It is anticipated that success in this en-deavor will facilitate the creation of new, interesting, and potentially useful materials. The project addresses fundamental research issues in areas of electronic materials science having strong technological relevance. An important feature of the project is the strong emphasis on education, and the integration of research and education. The research program provides excel-lent opportunities for hands-on experience in the use of sophisticated scientific equipment. The resources available provide special opportunities for education and training of students involved in interdisciplinary forefront materials science research. ***

本项目结合实验和理论研究非流体静压应力对外延晶体生长和扩散动力学过程的影响。将研究晶体生长和表面扩散的应力依赖激活势垒高度对生长形态演变的影响。简单的、均匀的应力状态对平行和垂直于表面的薄膜中原子扩散的影响将被测量。非静水应力状态下的扩散理论将得到进一步发展。这项研究预计将建立一种方法，通过这种方法，在几个简单的、均匀的应力状态下测量动力学过程的应力依赖性，从而预测任意的、不均匀的应力状态的影响——这对未来半导体器件的设计很重要。它还允许确定在固体内部发生的过程，这些过程不能直接观察到，从原子理论计算的结果和对施加的外部应力的响应的实验观察。预计这一努力的成功将促进创造新的、有趣的和潜在有用的材料。本项目涉及电子材料科学领域的基础研究问题，具有很强的技术相关性。该项目的一个重要特点是非常重视教育，并将研究与教育相结合。该研究计划为使用先进科学设备的实践经验提供了极好的机会。现有的资源为参与跨学科前沿材料科学研究的学生提供了特殊的教育和培训机会。＊＊＊