Film Growth Mechanisms in Pulsed Laser Deposition

脉冲激光沉积中的薄膜生长机制

• 批准号: 9727369
• 负责人: Michael Aziz
• 金额: $ 37.57万
• 依托单位: Harvard University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-05-01 至 2002-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9727369&HistoricalAwards=false
• 关键词: Film; Growth; Mechanisms; Pulsed; Laser

9727369 Aziz This research project explores the growth of metal films produced by pulsed laser deposition (PLD). PLD uses an excimer laser to ablate a target to produce the depositing flux. The principal objectives are to develop a fundamental understanding of the kinetics of submonolayer island nucleation and growth and of the kinetics of solute segregation, trapping, and alloying. Films are grown by PLD with real time and post deposition structure and composition analysis. Systems are selected to provide a wide range of monomer diffusivity and deposition rate for model systems, such as face-centered cubic metals, where there is knowledge of the values of the basic activation energy parameters. Growth morphologies are followed in situ with RHEED and ex situ by UHV AFM/STM. PLD film growth is compared to films grown by molecular beam epitaxy and to kinetic Monte Carlo simulations and analytical theories. %%% It is anticipated that the enhanced understanding generated by this project will aid in the production of new, interesting, and potentially useful assemblies of material films. ***

小行星9727369 本研究项目探讨了脉冲激光沉积（PLD）产生的金属薄膜的生长。 PLD使用准分子激光器烧蚀靶以产生沉积熔剂。 主要目标是发展亚单层岛形核和生长的动力学和溶质偏析，捕获和合金化的动力学的基本理解。 用PLD法生长薄膜，并进行了真实的时间和沉积后的结构和成分分析。 选择系统以提供模型系统的广泛单体扩散率和沉积速率，例如面心立方金属，其中了解基本活化能参数的值。 生长形态随后在原位与RHEED和ex-situ的UHV AFM/STM。 PLD薄膜生长相比，通过分子束外延生长的薄膜和动力学蒙特卡罗模拟和分析理论。 预计该项目产生的增强的理解将有助于生产新的，有趣的和潜在有用的材料膜组件。 ***