SBIR Phase I: EUV Source for Semiconductor Metrology

这个小型企业创新研究第一阶段项目是开发一种用于工业应用的相干极紫外（EUV）光源，以支持EUV光刻。该项目的广泛影响代表了光学科学的基本兴趣领域。高次谐波产生（HHG）过程是基本量子物理在高能短时标极端条件下的结果。高次谐波相位匹配技术的发展代表了在前所未有的短长度和时间尺度上对物质进行精确相干操纵。进一步的理解可能使未来产生更短波长的相干光成为可能，适用于高分辨率生物成像。

This Small Business Innovation Research Phase I project is to develop a coherent extreme ultraviolet (EUV) light source for industrial application in support of EUV lithography.The Broad impact of this project represents an area of fundamental interest to optical science. The High Harmonic Generation (HHG) process is the result of basic quantum physics at the extreme of high energy and short time scales. The development of phase matching techniques for HHG represents the precise coherent manipulation of matter on unprecedented short length and time scales. A further understanding may make it possible in future to generate coherent light at even shorter wavelengths, suitable for ultrahigh resolution biological imaging.